Journal of the Korean Ceramic Society (한국세라믹학회지)

The Korean Ceramic Society (한국세라믹학회)
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Effects of Annealing Atmosphere on the Characteristics of Tin Oxide Films Prepared by RF-magnetron Sputtering

RF-magnetron Sputtering법에 의해 제조된 SnO2 박막 특성에 대한 열처리 분위기 효과

  • Choi, Gwang-Pyo (Research Institute of Energy Resources Technology, Chosun University) ;
  • Park, Yong-Ju (Research Institute of Energy Resources Technology, Chosun University) ;
  • Ryu, Hyun-Wook (Research Institute of Energy Resources Technology, Chosun University) ;
  • Noh, Whyo-Sup (Department of Advanced Materials Engineering, Chosun University) ;
  • Kwon, Yong (Department of Advanced Materials Engineering, Chosun University) ;
  • Park, Jin-Seong (Department of Advanced Materials Engineering, Chosun University)
  • 최광표 (조선대학교 에너지자원신기술연구소) ;
  • 박용주 (조선대학교 에너지자원신기술연구소) ;
  • 류현욱 (조선대학교 에너지자원신기술연구소) ;
  • 노효섭 (조선대학교 신소재공학과) ;
  • 권용 (조선대학교 신소재공학과) ;
  • 박진성 (조선대학교 신소재공학과)
  • Published : 2004.01.01
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Abstract

$SnO_2$ thin films were deposited on a $SiO_2$/Si substrate with the flow of Ar and $O_2$ of 25 sccm by RF-magnetron sputtering method. the post-annealing was conducted at $500^{\circ}C$ in atmosphere of dry air and $N_2$ were changed fairly, while those annealed in dry air resembled as-deposited films. This may be attributed to the desorption of adsorbed oxygen and the extraction of lattice oxygen during annealing. Resistivity of films annealed in $N_2$ was increased over 5 times than that of as-deposited films. It can be explained that the increment of resistivity may result from the discontinuous conduction path with change of microstructures after annealing in $N_2$.

RF 마그네트론 스퍼터링법을 이용하여 $SnO_2$ 박막을 증착하여 열처리 분위기에 따른 미세구조 및 표면상태 변화를 살펴보고 그에 따른 전기적 특성의 변화를 고찰하였다. 후속 열처리는 $500^{\circ}C$에서 공기와 질소 분위기하에서 수행되었으며, 미세구조 및 표면상태를 살펴보기 위하여 SEM, AFM과 XPS 측정을 실시하였다. 공기중에서 열처리된 경우에는 증착 초기상태와 유의차가 크지 않은 반면 질소 분위기에서 열처리한 후에는 미세구조와 표면의 화학적 상태의 변화가 크게 발생하였다. 이러한 결과는 상대적으로 낮은 산소 분압하에서 열처리 과정에서 흡착 산소의 탈착 및 격자산호의 유출에 기인하는 것으로 판단된다. 또한, 질소 분위기하에서의 열처리 후에 비저항이 열처리 전에 비하여 5배 이상 증가하였다. 이로부터 전하 전송자인 전자 농도의 증가에 비하여 미세구조의 변화에 따른 불연속적인 전도경로가 더 크게 영향을 미치는 것을 알 수 있다.

Keywords

References

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