Journal of the Korean Crystal Growth and Crystal Technology (한국결정성장학회지)

The Korea Association of Crystal Growth (한국결정성장학회)
권호 표지

Parametric study of diamond/Ti thin film deposition in microwave plasma CVD

공정변수에 따른 microwave plasma CVD 다이아몬드/Ti 박막 증착 양상 조사

  • Cho Hyun (Department of Materials Engineering, Miryang National University) ;
  • Kim Jin Kon (Department of Materials Engineering, Miryang National University)
  • 조현 (밀양대학교 신소재공학부) ;
  • 김진곤 (밀양대학교 신소재공학부)
  • Published : 2005.02.01
Download PDF
⟨ Previous Next ⟩

Abstract

Effects of CH₄/H₂ flow rate ratio, chuck bias and microwave power on the structural properties and particle densities of diamond thin films deposited on Ti substrates in microwave plasma CVD were examined. High quality diamond thin films were deposited on Ti substrates in 2∼3 CH₄ Vol.% conditions due to the preferential formation of sp³-bonus ana selective removal of sp²-bonus in the CH₄/H₂ mixtures, and the mechanism for the formation of diamond particles on Ti was analysed. Diamond particle density increased with increasing negative chuck bias to Ti substrate due to bias-enhanced nucleation of diamond and the threshold voltage was found at ∼-50 V. With increasing microwave power the evolution from micro-crystalline graphite layer to diamond layer was observed.

Microwave plasma CVD 다이아몬드/Ti 박막 성장 시 CH₄/H₂ 가스의 유량비율, chuck bias, microwave power 등이 다이아몬드 박막의 구조적 특성과 입자밀도에 미치는 영향에 대하여 조사하였다. 2∼3 CH₄ Vol.% 조건일 때 sp³-결합성의 탄소 neutral 들이 우선적으로 형성되고 sp²-결합성의 탄소 neutral 들이 선택적으로 제거됨에 따라 양질의 다이아몬드 박막을 얻을 수 있었으며, 다이아몬드 입자 증착 기구를 해석하였다. Ti 기판에 걸어준 negative chuck bias가 증가함에 따라 다이아몬드 핵생성이 증진되어 다이아몬드 입자 밀도가 증가하였고, 임계 전압은 약 -50V 임을 확인하였다. 또한, microwave power가 증가함에 따라 미세결정질(micro-crystalline) graphite 층 생성이 제어되고 다이아몬드 층이 형성됨을 확인하였다.

Keywords

References

  1. E. Worner, 'Low-pressure synthetic diamond', Eds. B. Dischler and C. Wild (Springer, Berlin, 1998) p.165
  2. P.S. Weiser, S. Prawer, A. Hoffman, P.J.K. Paterson and R.R. Manory, 'Chemically vapor deposited diamond films grown on titanium nitride coated and uncoated iron substrates', J. Appl. Phys. 76 (1994) 2164 https://doi.org/10.1063/1.357628
  3. J.C. Angus, 'Diamond and diamond-like films', Thin Solid Films 216 (1992) 126
  4. T. Grogler, E. Zeiler, A. Franz, O. Plewa, S.M. Rosiwal and R.F. Singer, 'Erosion resistance of CVD diamond-coated titanium alloy for aerospace applications', Surface & Coatings Technol. 112 (1999) 129
  5. G. Heinrich, T. Grogler, S.M. Rosiwal and R.F. Singer, 'CVD diamond coated titanium alloys for biomedical and aerospace applications', Surface & Coatings Technol. 94-95 (1997) 514 https://doi.org/10.1016/S0257-8972(97)00459-3
  6. J.K. Kim, S.C. Ryu and H. Cho, 'Diamond thin film deposition of Ni in microwave plasma CVD', J. Kor. Crys. Growth 12 (2002) 311
  7. T. Sato, S. Furuno, S. Iguchi and M. Hanaboss, 'Diamond-like carbon films prepared by pulsed laser evaporation', Appl. Phys. A45 (1988) 355
  8. S.D. Wolter, J.T. Glass and B.R. Stoner, 'Bias induced diamond nucleation studies on refractory metal substrates', J. Appl. Phys. 77 (1995) 5119 https://doi.org/10.1063/1.359322
  9. L.J. Balk and R. Heiderhoff, 'Diamond films handbook', Ed. J. Asmussen and D.K. Reinhard (Marcel Dekker, New York, 2002) p. 29
  10. H. Tsai and D.B. Bogy, 'Critical review characterization of diamondlike carbon films and their application as overcoats on thin-film media for magnetic recording', J. Vac. Sci. Technol. A5 (1987) 3287
  11. X.S. Sun, H.K. Woo, I. Bello, C.S. Lee and S.T. Lee, 'Mechanistic study of ion-induced diamond nucleation', Diamond and Related Mater. 8 (1999) 48
  12. B.W. Sheldon, R. Csencsits, J. Rankin, R.E. Boekenhauer and Y. Shigesato, 'Bias-enhanced nucleation of diamond during microwave-assisted chemical vapor deposition', J. Appl. Phys. 75 (1994) 5001
  13. R.I. Murakami, A. Kikuyama and M. Kondo, 'Diamond nucleation by microwave plasma CVD on pure titanium substrates', Proceeding of 2nd Inter. Conf. on Advanced Mater. Development 2 (1999) 738
  14. T. Tachibana, Y. Yokota, K. Hayashi, K. Miyata, K. Kobashi and Y. Shintani, 'Parametric study of bias-enhanced nucleation of diamond on platinum in microwave plasma', Diamond and Related Mater. 9 (2000) 251
  15. M.N. Gamo, T. Ando, K. Yamamoto, P.A. Dennig and Y. Sato, 'Nucleation and growth of orientad diamond on Si(100) by bias-assisted chemical vapor deposition', J. Mater. Res. 12 (1997) 1351
  16. J. Robertson, J. Gerber, S. Sattel, M. Weiler, K. Jung and H. Ehrhardt, 'Mechanism of bias-enhanced nucleation of diamond on Si', Appl. Phys. Lett. 66 (1995) 3287