Korean Journal of Optics and Photonics (한국광학회지)

Optical Society of Korea (한국광학회)
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Analysis of thermal properties of the photo polymer hologram for practical applications

포토폴리머 홀로그램의 실용적 응용을 위한 그 열적 특성 분석

  • Kim, Jung-Hoi (Dept. of Computer&Communication Eng., Chungbuk Nat'l Univ. Industrial Technology Research Park) ;
  • Lee, Hang-Su (Dept. of Computer&Communication Eng., Chungbuk Nat'l Univ. Industrial Technology Research Park) ;
  • Kim, Nam (Dept. of Computer&Communication Eng., Chungbuk Nat'l Univ. Industrial Technology Research Park) ;
  • Jeon, Seok-Hee (Electronic Engineering Department, Incheon University)
  • 김정회 (충북대학교 전기전자컴퓨터 공학부) ;
  • 이행수 (충북대학교 전기전자컴퓨터 공학부) ;
  • 김남 (충북대학교 전기전자컴퓨터 공학부) ;
  • 전석희 (인천대학교 전자공학과)
  • Published : 2005.02.01
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Abstract

This paper presents the thermal characteristics of a Bragg grating recorded in photopolymer. We record hologram gratings using a 532 nm Nd : YAG laser in DuPont HRF 150-38 photopolymer films and analyze the diffraction efficiency versus thermal exposure conditions. For the case of recording after heating, the diffraction efficiency of the hologram is more than $70\%$ at $100^{\circ}C$ but is decreased exponentially at temperatures over $100^{\circ}C$. It is observed in the recording before heating that the diffraction efficiency of the hologram fixed by a UV light is increased to approximately $10\%$ at $100^{\circ}C$, but the holograms are erased at temperatures over $120^{\circ}C$.

본 논문에서는 포토폴리머에 기록된 Bragg 회절 격자의 열적 특성을 측정하였다. 532 nm의 Nd:YAG 레이저를 이용하여 DuPont HRF-l50-38 필름에 홀로그램 격자를 기록하고, 온도 노출 조건에 따라 회절효율을 측정하였다. 열 노출 후 홀로그램 기록에서는 $100^{\circ}C$이하에서 $70\%$이상의 높은 회절 효율을 보인 반면 더 높은 온도에서는 급격히 떨어졌다. 홀로그램 기록 후 열 노출에서는 UV 정착 효과에 따라 $100^{\circ}C$까지는 $10\%$ 정도의 효율 증가를 보여주었지만, $120^{\circ}C$이상에서는 홀로그램이 지워지는 현상이 관찰되었다.

Keywords

References

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