Korean Journal of Materials Research (한국재료학회지)

Materials Research Society of Korea (한국재료학회)
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Influence of Plasma Discharge Power on the Electrical and Optical Properties of Aluminum Doped Zinc Oxide Thin Films

  • Moon, Yeon-Keon (Department of Materials Science and Engineering, Hanyang University) ;
  • Park, Jong-Wan (Department of Materials Science and Engineering, Hanyang University)
  • Published : 2006.06.27
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Abstract

Al-doped ZnO (AZO) thin films were grown on type of glass#1737 substrates by DC magnetron sputtering. The structural, electrical and optical properties of the films were investigated as a function of various plasma discharge power. The obtained films were polycrystalline with a hexagonal wurtzite structure and preferentially oriented in the (002) crystallographic direction. The lowest resistivity was $6.0{\times}10^{-4}{\Omega}cm$ with the carrier concentration of $2.69{\times}10^{20}cm^{-3}$ and Hall mobility of 20.43 $cm^2/Vs$. The average transmittance in the visible range was above 90%.

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References

  1. A. E. Delahoy and M. Cherny, Master. Res. Soc. Symp. Proc., 426, 467 (1996) https://doi.org/10.1557/PROC-426-467
  2. Junqing Zhao, Shijie Xie, Shenghao Han, Zhiwei Yang, Lina Ye, and Tianlin Yang, Synthetic Metals, 144(3), 251-254 (2000)
  3. Natela R. Aghamalyan, Rubon K. Hovsepyan and Armen R. Poghosyan Proc. SPIE Int. Soc. Opt. Eng., 161, 5520 (2004)
  4. Z. K. Tang, P. Yu, G. K. L. Wang, M. Kawasaki, A. Ohtomo, H. Koinuma and Y. Segawa, Solid State Commun, 103(8), 459(1997) https://doi.org/10.1016/S0038-1098(97)00216-0
  5. Navina Mehan, Kondepudy Sreenivas and Abhai Mansingh Proc. SPIE Int. Soc. Opt. Eng., 251, 5415 (2004)
  6. Q. H. Li, Y. X. Liang, Q. Wan and T. H. Wang, Appl. Phys. Lett., 85(24), 5923 (2004) https://doi.org/10.1063/1.1836870
  7. S. J. Pearton, D. P. Norton, K. Ip, Y. W. Heo and T. Steiner, Progress in Materials Science., 50(3),293 (2005) https://doi.org/10.1016/j.pmatsci.2004.04.001
  8. D. C Look, G. M. Reniund, R. H. Brugener and J. R. Sizelove. Appl. Phys. Lett., 85(24), 5269 (2004) https://doi.org/10.1063/1.1825615
  9. Oshihiro Miyata, Satoshi Ida and Tadatsugu Minami. J. Vac. Sci. Technol., A 21(4), 1404, (2003) https://doi.org/10.1116/1.1580492
  10. Alexander I. Khudobenko, Alexander N. Zherikhin, R. T. Williams, J. Wilkinson, K. B. Ucer, G. Xiong and V. V. Voronov. Proc. SPIE Int. Soc. Opt. Eng., 317, 5121 (2003)
  11. Xiang Liu, Xiaohua Wu, Hui Cao and R. P. H. Chang, J. Appl. Phys., 95(6), 3141 (2004) https://doi.org/10.1063/1.1646440
  12. Agus Setiawan, Zahra Vashaei et al. J. Appl. Phys., 96(7), 3763 (2004) https://doi.org/10.1063/1.1785852
  13. N. Serpone, D. Lawless and R. Khairutdinow J. Phys. Chem., 99, 16646 (1995) https://doi.org/10.1021/j100045a026
  14. I. K. El Zawawi, R. A. Abd Alla, Thin Solid Films, 339, 314, (1999) https://doi.org/10.1016/S0040-6090(98)01324-8
  15. Haisheng San, Bin Li, Boxue Feng, Yuyang He and Chong Chen, Thin Solid Films, 483(1), 245 (2005) https://doi.org/10.1016/j.tsf.2004.12.028
  16. K. L. Chopra, S. Major and D. K. Pandya, Thin Solid Films, 102(1), 1 (1983) https://doi.org/10.1016/0040-6090(83)90256-0
  17. Milton Ohring, in Materials Science of Thin Films, ACADEMIC, second edition, p. 176