DOI QR코드

DOI QR Code

Fabrication of Transparent and Conductive Al-doped ZnO Films for Solar Cells

태양전지용 ZnO:Al 투명전도막의 제작

  • Tark, Sung-Ju (Department of Materials Science and Engineering, Korea University) ;
  • Kang, Min-Gu (Department of Materials Science and Engineering, Korea University) ;
  • Kim, Dong-Hwan (Department of Materials Science and Engineering, Korea University)
  • Published : 2006.07.27

Abstract

Al-doped zinc oxide (ZnO:Al) films for transparent electrodes in thin film solar cells were deposited on glass substrates at a low temperature of $200^{\circ}C$ by rf magnetron sputtering. The transmittance of the ZnO:Al films in the visible range was 87%. The lowest resistivity of the ZnO:Al films was about $5.8{\times}10^{-4}{\Omega}$ cm at the Al content of 2.5 wt%. After deposition, the surface of ZnO:Al films were etched in dilute HCl (0.5%) for the investigation of the change in the electrical properties and the surface morphology due to etching.

Keywords

References

  1. J. Springer, B. Rech, W. Reetz, J. Muller and M. Vanecek, Sol. Energy Mater. Sol. Cells., 85, 1 (2005) https://doi.org/10.1016/j.solmat.2004.02.020
  2. J. B. Yoo, A. L. Fahrenbruch and R. H. Bube, J. Appl. Phys. 68, 4694 (1990) https://doi.org/10.1063/1.346148
  3. Z. C. Jin, J. Hamberg and C. G. Granqvist, J. Appl. Phys., 64, 5117 (1988) https://doi.org/10.1063/1.342419
  4. K. L. Chopra, S. Major and D. K. Pandya, Thin Solid Films, 102, 1 (1983) https://doi.org/10.1016/0040-6090(83)90256-0
  5. W. S. Lan, S. J. Fonash, J. Electron Mater., 16, 141 (1987) https://doi.org/10.1007/BF02655478
  6. R. J. Hong, X. Jiang, V. Sittinger, B. Szyszka, T. H?ing and G. Br?uer, Journal of Vacuum Science & Technology, 20(3), 900 (2002) https://doi.org/10.1116/1.1472420
  7. A. Yamada, Wilson W. Wenas and M, Yoshino, Jpn. J. Appl. Phys., 30, L1152 (1991) https://doi.org/10.1143/JJAP.30.L1152
  8. Mizuhashi M, Goto Y and Adachi K. Jpn J Appl Phys., 27, 2053 (1988) https://doi.org/10.1143/JJAP.27.2053
  9. W. S. Lan and S. J. Fonash, J. Electron. Mater., 16, 141 (1987) https://doi.org/10.1007/BF02655478
  10. V. Srikant and D. R. Clarke, J. of Appl. physics, 81(9), 6357 (1997) https://doi.org/10.1063/1.364393
  11. E. Burstein, Phys. Rev., 93, 632 (1954) https://doi.org/10.1103/PhysRev.93.632
  12. T. S. Moss, Proc. R. Soc. London, Ser., B67, 775 (1954)
  13. H. Ohta and H. Hosono, Materials Today, 7, 42 (2004) https://doi.org/10.1016/S1369-7021(04)00288-3
  14. C. R. Aita, A. J. Purdes, R. J. Lad and P. D. Funkenbusch, J. Appl. Phys., 51, 5533 (1980) https://doi.org/10.1063/1.327472
  15. B. S. Tu, E. S. Kim, S. W. Too and J. H. Lee, J. Kor. Ceram. Soc., 32, 799 (1996)
  16. J. O. Barens, D. J. Leary and A. G. Jordan, J. Electrochem. Soc., 7, 1636 (1980) https://doi.org/10.1149/1.2129966
  17. K. Ellmer, R. Cebulla and R. Wendt, Thin Solid Films, 317, 413 (1998) https://doi.org/10.1016/S0040-6090(97)00633-0
  18. O. Kluth, B. Rech, L. Houben, S. Wider and G. Schope, Thin Solid Films, 351, 247 (1999) https://doi.org/10.1016/S0040-6090(99)00085-1
  19. J. A. Anna, Selven, K. Keppner and A. Shan, Mater. Res. Soc. Smp. Proc., 426, 497 (1997)

Cited by

  1. Characterization of Seawater Electrolysis of Insoluble Catalytic Electrodes Fabricated by RF Magnetron Sputtering vol.22, pp.2, 2012, https://doi.org/10.3740/MRSK.2012.22.2.86