Nano Molding Technology for Optical Storage Media with Large-area Nano-pattern

대면적 광 정보저장매체의 나노성형에 대한 기술 개발

  • 신홍규 (강원대 기계메카트로닉스공학부 대학원) ;
  • 반준호 (강원대 기계메카트로닉스공학부 대학원) ;
  • 조기철 (강원대 기계메카트로닉스공학부 대학원) ;
  • 김헌영 (강원대 기계메카트로닉스공학과) ;
  • 김병희 (강원대학교 기계메카트로닉스공학과)
  • Published : 2006.04.01

Abstract

Hot embossing lithography(HEL) has the production advantage of comparatively few process step, simple operation, a relatively low cost for embossing tools(Si), and high replication accuracy for small features. In this paper, we considered the nano-molding characteristic according to molding parameters(temperature, pressure, times, etc) and induced a optimal molding condition using HEL. High precision nano-patter master with various shapes were designed and manufactured using the DRIE(Deep Reactive ion Etching), LPCVD(Low Pressure Chemical Vapor Deposition) and thermal oxidation process, and we investigated the molding characteristic of DVD and Blu-ray nickel stamp. We induced flow behaviors of polymer, rheology by shapes and sizes of the pattern through various molding experiments. Finally, with achieving nano-structure molding with high aspect ratio, we will secure a basic technology about the molding of large-area nano-pattern media.

Keywords

References

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