디지털마이크로미러소자를 동적마스크 패턴생성기로 응용한 마이크로광조형

Microstereolithography using a Digital Micromirror Device as the Dynamic Pattern Generator

  • 주재영 (광주과학기술원 기전공학과) ;
  • 김성훈 (광주과학기술원 기전공학과) ;
  • 변홍석 (국방과학기술원) ;
  • 이관행 (광주과학기술원 기전공학과) ;
  • 정성호 (광주과학기술원 기전공학과)
  • 발행 : 2006.07.01

초록

In order to increase the productivity of conventional microstereolithography, a new method using a digital micromirror device ($DMD^{TM}$) as the dynamic patter generator is proposed. The deviation from the level of clear optical images to the level of photopolymer surface is a key for the fabrication of an accurate 3D structure, so this deviation is minimized by controlling the viscosity of FA 1260T with organic solvents. After finding the appropriate process variables, the feasibility of microstructure fabrication such as a microgear and a microsphere is demonstrated. Microstereolithography with $DMD^{TM}$ showed the potential to replace the existing focused beam microstereolithography.

키워드

참고문헌

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