DOI QR코드

DOI QR Code

Synthesis of ZrTiO4 and Ta2Zr6O17 Films by Composition-Combinatorial Approach through Surface Sol-Gel Method and Their Dielectric Properties

  • Published : 2007.09.20

Abstract

Single phases of multi-component oxides films, ZrTiO4 and Ta2Zr6O17, could be synthesized by using the combinatorial approach through surface sol-gel route, coating the appropriate mole ratio of 100 mM zirconium butoxide, tantalum butoxide and titanium butoxide precursors on Pt/Ti/SiO2/Si (100) substrate, following pyrolysis at 450 oC, and annealing them at 770 oC. Both the films and bulks of ZrTiO4 and Ta2Zr6O17 showed very stable dielectric properties in temperature range, ?140 to 60 oC, and frequency range, 100 Hz to 1 MHz, promising their applications in wide range of temperatures and frequencies. The dielectric constants of the films were lower and a little more dependent on frequency than those of the bulks. The reduction of dielectric property in the film was mainly due to the interfacial effects that worked as series and parallel-connected capacitances toward the substantial film capacitance.

Keywords

References

  1. Nisonoff, A.; Hopper, J. E.; Spring, S. B. The Antibody Molecule; Academic Press: New York, 1975
  2. Xiang, X.-D.; Sun, X.; Briceno, G.; Lou, Y.; Wang, K.-A.; Chang, H.; Wakkace-Freedman, W. G.; Chen, S.-W.; Schultz, P. G. Science 1995, 268, 1738
  3. Dover, R. B.; Schneemeyer, L. F.; Fleming, R. M. Nature 1998, 392, 162 https://doi.org/10.1038/32381
  4. Kim, H.-K.; Sathaye, S. D.; Hwang, Y. K.; Jhung, S. H.; Hwang, J.-S.; Kwon, S. H.; Park, S.-E.; Chang, J.-S. Bull. Korean Chem. Soc. 2005, 26(11), 1881 https://doi.org/10.5012/bkcs.2005.26.11.1881
  5. Ichnose, I.; Senzu, H.; Kunitake, T. Chem. Mater. 1997, 9, 1296 https://doi.org/10.1021/cm970008g
  6. Ichnose, I.; Kawakami, T.; Kunitake, T. Adv. Mater. 1998, 10, 535 https://doi.org/10.1002/(SICI)1521-4095(199805)10:7<535::AID-ADMA535>3.0.CO;2-Q
  7. Fang, M.; Kim, C. H.; Martin, B. R.; Mallouk, T. E. J. Nanopar. Res. 1999, 1, 43 https://doi.org/10.1023/A:1010061612772
  8. Kim, C. H.; Lee, M. Bull. Korean Chem. Soc. 2002, 23(5), 741 https://doi.org/10.1007/BF02705921
  9. Zou, H.; Lin, Y. S. Applied Catalysis A: General 2004, 265, 35 https://doi.org/10.1016/j.apcata.2004.01.015
  10. Cosentino, I. C.; Muccillo, E. N. S.; Muccillo, R. J. Sol-Gel Science and Technol. 2006, 37, 31 https://doi.org/10.1007/s10971-005-5062-2
  11. Shinriki, H.; Nakata, M. IEEE Trans. Electron Devices 1991, ED-38, 455
  12. Fujikawa, H.; Taga, T. J. Appl. Phys. 1994, 75, 2538 https://doi.org/10.1063/1.356227
  13. Cava, R. F.; Peck Jr, W. F.; Krajewski, J. J. Nature 1995, 377, 215 https://doi.org/10.1038/377215a0
  14. Russell, R. A.; Phule, P. P. Mater. Science and Eng. B 1993, 21, 88 https://doi.org/10.1016/0921-5107(93)90271-N
  15. Ro, Y.-A.; Kim, S.-J.; Lee, Y.-K.; Kim, C. H. Bull. Korean Chem. Soc. 2001, 22, 1231
  16. Natori, K.; Otani, D.; Sano, N. Appl. Phys. Let. 1998, 73, 632 https://doi.org/10.1063/1.121930
  17. Li, H.-C.; Si, W.; West, A. D.; Xi, X. X. Appl. Phys. Let. 1998, 73, 464
  18. Basceri, C.; Streiffer, S. K.; Kingon, A. I. J. Appl. Phys. 1997, 82, 2497 https://doi.org/10.1063/1.366062
  19. Wolfram, G.; Globel, E. Mater. Res. Bull. 1981, 16, 1455 https://doi.org/10.1016/0025-5408(81)90066-0
  20. Wakino, K.; Minai, K.; Tamura, H. J. Am. Ceram. Soc. 1984, 67, 278 https://doi.org/10.1111/j.1151-2916.1984.tb18847.x
  21. Heiao, Y.-C.; Wu, L.; Wei, C.-C. Mater. Res. Bull. 1988, 23, 1687
  22. Bhattacharya, A. K.; Hartridge, A.; Mallick, K. K.; Tayler, D. J. Mat. Sci. 1996, 31, 5583 https://doi.org/10.1007/BF01160801
  23. Elissalde, C.; Cross, E.; Randall, C. A. J. Am. Ceram. Soc. 1996, 79, 2041 https://doi.org/10.1111/j.1151-2916.1996.tb08935.x
  24. Bianco, A.; Gusmano, G.; Freer, R.; Smith, P. J. Eur. Ceram. Soc. 1999, 19, 959 https://doi.org/10.1016/S0955-2219(98)00353-7

Cited by

  1. Atomic layer deposition and properties of mixed Ta2O5 and ZrO2 films vol.7, pp.2, 2017, https://doi.org/10.1063/1.4975928
  2. Dielectric properties of continuous composition spreaded MgO-Ta2O5 thin films vol.258, pp.2, 2007, https://doi.org/10.1016/j.apsusc.2011.09.004
  3. Effect of Argon/Oxygen Flow Rate Ratios on DC Magnetron Sputtered Nano Crystalline Zirconium Titanate Thin Films vol.68, pp.6, 2007, https://doi.org/10.1007/s11837-016-1910-5