A Study on the Sputtering System Using Ion Plating Technique

이온 플레이팅 응용 스퍼터링 장치에 관한 연구

  • Published : 2007.12.01

Abstract

In this paper, to produce sheet plasma with high density for ion plating, we designed magnetic circuit of ion plating device consisting of solenoid coil and rectangular permanent magnet. And, we analyzed the effects of the magnetic field distribution using FEM (Finite Element Methode). Additionally, we made a sputtering system including ion plating technique on the basis of the design and verified the possibility of the sheet plasma application for advanced sputter system.

Keywords

References

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