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Deposition and Characterization of Antistiction Layer for Nanoimprint Lithography by VSAM (Vapor Self Assembly Monolayer)

기상 자기조립박막 법을 이용한 나노임프린트용 점착방지막 형성 및 특성평가

  • Cha, Nam-Goo (Division of Materials and Chemical Engineering, Hanyang University) ;
  • Kim, Kyu-Chae (Division of Materials and Chemical Engineering, Hanyang University) ;
  • Park, Jin-Goo (Division of Materials and Chemical Engineering, Hanyang University) ;
  • Jung, Jun-Ho (Precision Machining Group, Korea Institute of Machinery & Materials) ;
  • Lee, Eung-Sug (Precision Machining Group, Korea Institute of Machinery & Materials) ;
  • Yoon, Neung-Goo (Sorona Inc., Ltd.)
  • 차남구 (한양대학교 재료화공학부) ;
  • 김규채 (한양대학교 재료화공학부) ;
  • 박진구 (한양대학교 재료화공학부) ;
  • 정준호 (한국기계연구원 지능형정밀기계연구부) ;
  • 이응숙 (한국기계연구원 지능형정밀기계연구부) ;
  • 윤능구 (㈜소로나)
  • Published : 2007.01.27

Abstract

Nanoimprint lithography (NIL) is a new lithographic method that offers a sub-10nm feature size, high throughput, and low cost. One of the most serious problems of NIL is the stiction between mold and resist. The antistiction layer coating is very effective to prevent this stiction and ensure the successful NIL results. In this paper, an antistiction layer was deposited by VSAM (vapor self assembly monolayer) method on silicon samples with FOTS (perfluoroctyltrichlorosilane) as a precursor for making an antistiction layer. A specially designed LPCVD (low pressure chemical vapor deposition) was used for this experiment. All experiments were achieved after removing the humidity. First, the evaporation test of FOTS was performed for checking the evaporation temperature at low pressure. FOTS was evaporated at 5 Tow and $110^{\circ}C$. In order to evaluate the temperature effect on antistiction layer, chamber temperature was changed from 50 to $170^{\circ}C$ with 0.1ml of FOTS for 1 minute. Good hydrophobicity of all samples was shown at about $110^{\circ}$ of contact angle and under $20^{\circ}$ of hysteresis. The surface energies of all samples calculated by Lewis acid/base theory was shown to be about 15mN/m. The deposited thicknesses of all samples measured by ellipsometry were almost 1nm that was similar value of the calculated molecular length. The surface roughness of all samples was not changed after deposition but the friction force showed relatively high values and deviations deposited at under $110^{\circ}$. Also the white circles were founded in LFM images under $110^{\circ}$. High friction forces were guessed based on this irregular deposition. The optimized VSAM process for FOTS was achieved at $170^{\circ}C$, 5 Torr for 1 hour. The hot embossing process with 4 inch Si mold was successfully achieved after VSAM deposition.

Keywords

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