Preparation and Characterization of High-purity Quartz Panel Using Wet-chemical Method

습식화학법을 이용한 고순도 석영유리 기판 제조 및 특성평가

Quartz glass panel was prepared by a colloidal silica through the heat-treatment only without any additives in wet-chemical method. This colloidal silica used in slurry process has the uniform distribution of particle size and lower cost. The results show that 6N as a degree of purity and the 86 percentage of violet transmittance in 1mm thickness. AFM(Atomic Force Microscopy) pattern shows that the surface roughness are less than lnm. Also, we investigated the characteristic of quartz panel according to the concentration and distribution of hydroxyl group, viscosity and thermal expansion coefficient.