The Transactions of The Korean Institute of Electrical Engineers (전기학회논문지)

The Korean Institute of Electrical Engineers (대한전기학회)
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The Effect of Different Substrate Temperature on the Electrical Properties of Al-doped ZnO Thin Films

Al-doped ZnO 박막의 기판 온도에 따른 전기적, 광학적 특성

  • 김봉석 (성균관대학 전자전기공학과) ;
  • 김응권 (성균관대학 전자전기공학과) ;
  • 이규일 (성균관대학 전자전기공학과) ;
  • 오수영 (성균관대학 전자전기공학과) ;
  • 송준태 (성균관대학 전자전기공학과)
  • Published : 2007.10.01
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Abstract

In this paper, the effect of substrate temperature on structural, electrical and optical properties of aluminium-doped zinc oxide (AZO) films were investigated. AZO thin films were prepared on glass substrate by pulsed DC magnetron sputtering technique. The properties of AZO were measured by using XRD, AFM, UV spectrophotometer, and hall effect measurement system. The resistivity of AZO films was improved under the condition of high substrate temperature. The resistivity decreased from $9.95{\times}10^{-2}\;{\Omega}-cm\;to\;1.1{\times}10^{-3}\;{\Omega}-cm$ as a result of high substrate temperature and the average transmittances in visible range were above 80%.

Keywords

References

  1. P. Nunes, E. Fortunato, P. TonelIo, F. Braz Fernandes, P. Vilarinho, R. Martins, 'Effect of different dopant elements on the properties of ZnO thin films', Vacuum 64, 281-285, 2002 https://doi.org/10.1016/S0042-207X(01)00322-0
  2. H.T. Cao, Z.L. Pei, J. Gong, C. Sun, R.F. Huang, L.S. Wen, 'Transparent conductive Al and Mn doped ZnO thin films prepared by DC reactive magnetron sputtering', Surface and Coatings Technology 184, 84-92, 2004 https://doi.org/10.1016/j.surfcoat.2003.09.046
  3. W. Li, Y. Sun. Y. Wang, H. Cai, F. Liu, Q. He, 'Effects of substrate temperature on the properties of facing-target sputtered AI-doped ZnO films', Solar Energy Materials & Solar Cells, V.91, 659-663, 2007 https://doi.org/10.1016/j.solmat.2006.11.018
  4. J. Mass, P. Bhattacharya, R.S. Katiyar, 'Effect of high substrate temperature on AI-doped ZnO thin films grown by pulsed laser deposition', Materials Science and Engineering B103, 9-15, 2003
  5. J. B. Lee, H. J. Lee, S. H Seo, J. S. Park, 'Deposition of ZnO thin films by RF magnetron sputtering and Cu-doping effects', KIEE, v. 49 no.12, 654-664, 2000
  6. X. Z. Qiang, D. Hong, L. Yan, C. Hang, 'AI-doped effects on structure, electrical and optical properties of c -axis-oriented ZnO:AI thin films', Materials Science in Semiconductor Processing, v.9 no.1, 132-135, 2006 https://doi.org/10.1016/j.mssp.2006.01.082
  7. I. W. Kim, S. J. Doh, C. C. Kim, H. J. Jung, J. Tashiro, M. Yoshimoto, 'Effect of evaporation on surface morphology of epitaxial ZnO films during postdeposition annealing', Applied Surface Science, 241, 179- 182, 2005 https://doi.org/10.1016/j.apsusc.2004.09.087