References
- J. S. Yoon and B. I. Kim, J. Power. Sour. 164, 959 (2007) https://doi.org/10.1016/j.jpowsour.2006.11.035
- M. Bischof, S. Mayer, H. Leitner, H. Clemens, P. Staron, E. Geiger, A. Voiticek, W. Knabl, Int. J. Refr. Met. Hard. Mater., 24, 437-444 (2006) https://doi.org/10.1016/j.ijrmhm.2005.08.001
- P. Angerer, E. Neubauer, L. G. Yu, K. A. Khor, nt. J. Refr. Met. Hard. Mater., 25, 280-285 (2007) https://doi.org/10.1016/j.ijrmhm.2006.10.001
- M. Yue, J. X. Zhang, W. Q. Liu, G. P. Wang, J. Magn. Magn. Meter., 271, 364-368 (2003) https://doi.org/10.1016/j.jmmm.2003.10.002
- J. X. Zhang, Q. M. Lu, K. G. Liu, L. Zhang, M. L. Zhou, Mater.Lett. 58, 1981-1984 (2004) https://doi.org/10.1016/j.matlet.2003.11.032
- J. R. Groza and A. Zavaliangos, Mater. Sci. Eng. A287, 171-177 (2000) https://doi.org/10.1016/S0921-5093(00)00771-1
- U. Anselmi-Tamburini, S. Gennari, J. E. Garay and Z. A. Munir, Mater. Sci. Eng., A394, 139-148 (2005) https://doi.org/10.1016/j.msea.2004.11.019
- N. Tamari, T. Tanaka, K. Tanaka, I. Kondoh, M. Kawahara and M. Tokita, J. Ceram. Soc. Jpn., 103, 740 (1995) https://doi.org/10.2109/jcersj.103.740
- D. Rittel, A. Bhattacharyya, B. Poon, J. Zhao and G. Ravichandran, Mater. Sci. Eng., A447, 65-70 (2007) https://doi.org/10.1016/j.msea.2006.10.064
Cited by
- Manufacturing and Macroscopic Properties of Cold Sprayed Cu-In Coating Material for Sputtering Target vol.20, pp.3, 2011, https://doi.org/10.1007/s11666-010-9552-6
- Manufacturing and Macroscopic Properties of Cold Sprayed Cu-Ga Coating Material for Sputtering Target vol.20, pp.4, 2013, https://doi.org/10.4150/KPMI.2013.20.4.245