A Study on the Maskless Plate Making Technology for Screen Printing(I)

Maskless용 스크린 제판 기술 연구(I)

  • Lee, Mi-Young (Division of Image & Information, College of Engineering, Pukyong National University) ;
  • Park, Kyoung-Jin (Division of Image & Information, College of Engineering, Pukyong National University) ;
  • Nam, Su-Yong (Division of Image & Information, College of Engineering, Pukyong National University)
  • 이미영 (부경대학교 공과대학 화상정보공학부) ;
  • 박경진 (부경대학교 공과대학 화상정보공학부) ;
  • 남수용 (부경대학교 공과대학 화상정보공학부)
  • Published : 2008.03.01

Abstract

We have manufactured a photoresist which has excellent dispersity and good applying property due to 330cps of viscosity for environment-friendly and economical maskless screen plate making. And the photoresist applied on the screen stretched was exposed without mask by beam projector with CRT light source. Then it was developed by air spray with $1.7kgf/cm^2$ of injection pressure. The pencil hardness and solvent resistance of curing photoresist film were worse than those of conventional photoresist film and the maximum resolution of line image formed by maskless screen plate making was 0.5 mm since the exposure system for maskless plate making has weak light intensity and the diffusion of light. But we could obtain maskless screen plate which has sharp edges of line image and confirm a possibility of dry development process by air spray method.

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