열처리공학회지 (Journal of the Korean Society for Heat Treatment)

  • 제21권5호
  • /
  • Pages.235-243
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  • 2008
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  • 1225-1070(pISSN)
  • /
  • 2508-4046(eISSN)
한국열처리공학회 (The Korean Society for Heat Treatment)
권호 표지

듀얼 소스 증착장치를 이용한 Ni-C 박막의 특성에 관한 연구

A Study on the Characterization of Ni-C Thin Films Utilizing a Dual-Source Deposition System

  • 한창석 (호서대학교 국방과학기술학과) ;
  • 전창환 (호서대학교 국방과학기술학과) ;
  • 한승오 (호서대학교 융합기술연구소)
  • Han, Chang-Suk (Dept. of Defense Science & Technology, Hoseo University) ;
  • Chun, Chang-Hwan (Dept. of Defense Science & Technology, Hoseo University) ;
  • Han, Seung-Oh (Institute of Fusion Technology, Hoseo University)
  • 투고 : 2008.10.31
  • 심사 : 2008.11.20
  • 발행 : 2008.09.30
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초록

Ni-C composite films were prepared using a combination of microwave plasma CVD and ion beam sputtering deposition working in a codeposition way. The structure of these films was characterized by energy-dispersive X-ray diffraction (EDXRD), transmission electron microscopy (TEM) and Raman spectroscopy. It was found that a nickel carbide phase, $Ni_3C$ (hcp), formed as very fine crystallites over a wide temperature range when Ni-C films were deposited at low $CH_4$ flow rates. The thermal stability of this nonequilibrium carbide $Ni_3C$ was also studied. As a result, the $Ni_3C$ carbide was found to decompose into nickel and graphite at around $400^{\circ}C$. With high $CH_4$ flow rates (> 0.2 sccm), the structure of the Ni-C films became amorphous. The formation behavior of the carbide and amorphous Ni-C phases are discussed in relation to the electrical resistivity of the films.

키워드

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