한국광학회지 (Korean Journal of Optics and Photonics)

  • 제20권1호
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  • Pages.57-60
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  • 2009
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  • 1225-6285(pISSN)
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  • 2287-321X(eISSN)
한국광학회 (Optical Society of Korea)
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광학 박막을 채용한 CMOS 이미지 센서 픽셀의 수광 효율

Enhancement of Light Guiding Efficiency in CMOS Image Sensor by Introducing an Optical Thin Film

  • 강명훈 (인제대학교 대학원 나노시스템공학과) ;
  • 고은미 (인제대학교 대학원 나노시스템공학과) ;
  • 이제원 (인제대학교 대학원 나노시스템공학과) ;
  • 조관식 (인제대학교 대학원 나노시스템공학과)
  • Kang, Myung-Hoon (Department of Nano Systems Engineering, Inje University) ;
  • Ko, Eun-Mi (Department of Nano Systems Engineering, Inje University) ;
  • Lee, Je-Won (Department of Nano Systems Engineering, Inje University) ;
  • Cho, Guan-Sik (Department of Nano Systems Engineering, Inje University)
  • 발행 : 2009.02.25
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초록

CMOS 이미지 센서의 수광 효율을 높이기 위해서 픽셀의 광 통로 벽에 광학 박막의 도입을 제안하고자 한다. Essential Macleod를 이용하여 시뮬레이션해 본 결과, 전반사가 일어나는 범위가 현저히 증가하였다. 특히 공기 박막을 도입할 경우에, 그 효과가 가장 현저하여, 광 통로 벽에서의 전반사 임계각이 50도로까지 확대되었다.

We consider introducing an optical thin film to the light guiding wall of a pixel in order to enhance the light guiding efficiency of a CMOS image sensor. Simulating the reflectance as a function of the incidence angle using the Essential Macleod program, we find that the range of total internal reflection is greatly increased for several materials. Particularly when air is chosen as the thin film material, the critical angle of total internal reflection could be shifted to about 50 degrees.

키워드

참고문헌

  1. E. R. Fossum, “CMOS Image Sensors: Electronic Camera-On-A-Chip,” IEEE transaction on electron devices, vol. 44, no.10, pp. 1689-1698, 1997 https://doi.org/10.1109/16.628824
  2. M. Bigas, E. Cabruja, J. Forest, and J. Salvi, “Review of CMOS image sensors,” Microelectronics Journal, vol. 37, pp. 433-451, 2006 https://doi.org/10.1016/j.mejo.2005.07.002
  3. H. Rhodes, G. Agranov, C. Hong, U. Boettiger, R. Mauritzson, J. Ladd, I. Karasev, J. McKee, E. Jenkins, W. Quinlin, I. Patrick, J. Li, X. Fan, R. Panicacci, S. Smith, C. Mouli, and J. Bruce, “CMOS Imager Technology Shrinks and Image Performance,” 2004 IEEE Workshop on Microelectronics and Electron Devices, pp. 7-18, 2004 https://doi.org/10.1109/WMED.2004.1297338
  4. Y. Chae, K. Choe, B. Kim, and G. Han, “Sensitivity Controllable CMOS Image Sensor Pixel Using Control Gate Overlaid on Photodiode,” Electron Device Letters. IEEE, vol. 28, Issue 6, pp. 495-498, 2007 https://doi.org/10.1109/LED.2007.897459
  5. C. H. Koo, H. K. Kim, K. H. Paik, D. C. Park, K. H. Lee, Y. K. Park, C. R. Moon, S. H. Lee, S. H. Hwang, D. H. Lee, and J. T. Kong, “Improvement of Crosstalk on 5M CMOS Image Sensor with $1.7{\times}1.7$ $um^2$ pixels,” Proc. of SPIE, vol. 6471, pp. 647115-1-5, 2007 https://doi.org/10.1117/12.701705
  6. G. Agranov, V. Berezin, and R. H. Tsai, “Crosstalk and Microlens Study in a Color CMOS Image Sensor,” IEEE transaction on electron devices, vol. 50, no. 1, pp. 4-11, 2003 https://doi.org/10.1109/TED.2002.806473
  7. T. H. Hsu, Y. K. Fang, C. Y. Lin, S. F. Chen, C. S. Lin, D. N. Yaung, S. G. Wuu, C. H. Tseng, J. S. Lin, and C. S. Wang, “Light Guide for Pixel Crosstalk Improvement in Deep Submicron CMOS Image Sensor,” IEEE electron device letters, vol. 25, no. 1, pp. 22-24, 2004 https://doi.org/10.1109/LED.2003.821597
  8. D. N. Yaung, S. G. Wuu, H. C. Chien, T. H. Hsu, C. H. Tseng, J. S. Lin, J. J. Chen, C. H. Lo, C. Y. Yu, C. S. Tssi, and C. S. Wang, “Air-Gap Guard Ring for Pixel Sensitivity and Crosstalk Improvement in Deep Sub-micron CMOS Image Sensor,” IEEE IEDM, vol. 401, pp. 16.5.1-16.5.4, 2003 https://doi.org/10.1109/IEDM.2003.1269308
  9. T. H. Hsu, Y. K. Fang, D. N. Yaung, S. G. Wuu, H. C. Chien, C. S. Wang, J. S. Lin, C. H. Tseng, S. F. Chen, C. S. Lin, and C. Y. Lin, “Color Mixing Improvement of CMOS Image Sensor With Air-Gap-Guard Ring in Deep-Submicrometer CMOS Technology,” IEEE electron device letters, vol. 26, no. 5, pp. 301-303, 2005 https://doi.org/10.1109/LED.2005.846574
  10. T. H. Hsu, Y. K. Fang, D. N. Yaung, S. G. Wuu, H. C. Chien, C. H. Tseng, L. L. Yao, W. D. Wang, C. S. Wang, and S. F. Chen, “A High-Efficiency CMOS Image Sensor With Air Gap in situ MicroLens (AGML) Fabricated by 0.18-${\mu}m$ CMOS Technology,” IEEE electron device letters, vol. 26, no. 9, pp. 634-636, 2005 https://doi.org/10.1109/LED.2005.854373
  11. 황보창권, 박막광학(테크 미디어, 서울, 2005)
  12. 김은지, “광 집적도를 향상시킨 시모스 이미지센서의 제조방법,” 대한한국 특허 10-2004-0069224, 2004
  13. 황충호, “금속막 마이크로렌즈를 구비한 이미지 센서,” 대한민국 특허 10-2003-0098504, 2003