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Refractive Index Dispersion of Sputter-Deposited Silicon-Rich Silica Thin Films

스퍼터링 방법으로 증착된 실리콘 과잉 실리카 박막의 굴절률 분산

  • Jin, Byeong-Kyou (Department of Materials Science and Engineering, Korea Aerospace University) ;
  • Choi, Yong-Gyu (Department of Materials Science and Engineering, Korea Aerospace University)
  • 진병규 (한국항공대학교 항공재료공학과) ;
  • 최용규 (한국항공대학교 항공재료공학과)
  • Published : 2009.01.31

Abstract

We have fabricated silicon-rich silica thin films via RF magnetron sputtering using a SiO target. Thickness evolution and microstructure change of such $SiO_x$ (1$SiO_x$ thin films turned out to be mainly responsible for the increase of refractive index.

Keywords

References

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