한국생산제조학회지 (Journal of the Korean Society of Manufacturing Technology Engineers)

  • 제18권6호
  • /
  • Pages.558-564
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  • 2009
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  • 2508-5093(pISSN)
  • /
  • 2508-5107(eISSN)
한국생산제조학회 (The Korean Society of Manufacturing Technology Engineers)
권호 표지

전자빔 리소그래피를 이용한 주사기법에 따른 패턴형상 조정

Pattern Shape Modulation by Scanning Methods in E-Beam Lithography

  • 오세규 (서울산업대학교 에너지환경대학원 나노아이티공학과) ;
  • 김승재 (서울산업대학교 나노생산기술연구소) ;
  • 김동환 (서울산업대학교 기계설계자동화공학부) ;
  • 박근 (서울산업대학교 기계설계자동화공학부) ;
  • 장동영 (서울산업대학교 산업정보시스템공학과)
  • 발행 : 2009.12.15
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초록

To aim at obtaining a correct and fine small pattern by an electron beam lithography several conditions and methods affecting a real pattern shape needs to be investigated. A micro/nano sized pattern shape is sometimes dependent on the scanning method. In this work, four types of scanning methods are implemented and their characteristics are investigated. For a $11\times11um$ pattern, a Zigzag scanning method proves a precise pattern generation. The other ways such as SEM scanning and swirl in-out scanning method result in some distorted pattern shape. It is proved that abrupt change in the pattern generation limits to obtaining a fine and small pattern.

키워드

참고문헌

  1. Sheats, J. R. and Smith, B. W., 1998, Technology roadmap for nanoelectronics, Marcel Dekker Inc., Europe.
  2. Madou, M. j., 2001, Fundamentals of microfabrication, CRC press, 2nd Ed., USA, pp. 53-57.
  3. Kim, S. T., Yang, D. S, Park, H. W., and Kim, T. H., 2005, "Technology of Semiconductor Industry and Development of Photoresist," Polymer Science and Technology, Vol. 16. No. 1, pp. 10-16.
  4. Nastaushev, Y. V., Gavrilova, T., Kachanova, M., Nenasheva, L., Kolosanov, V., Naumova, O. V., Popov, V. P., and Aseev, A. L., 2002, "20-nm Resolution of electron lithography for the nano devices on ultrathin SOI film," Matrials Science and Engineering, Vol. 19, pp. 189-192.
  5. Kim, J. G., Lee, J. J., Cho, S. H., Choi, D. S., and Lee, E. S., 2008, "Nano-machining Technology Using Electron Beam," Journal of the Korea Society for Precision Engineering, Vol. 25, No. 3, pp. 7-14.
  6. Park, S. Y., Lee, S. W., and Lee, J. J., 2006, "Nano-Scale Device Fabrication by Electron Beam Lithography," 2006 Fall C Lee, Journal of the Korean Society for Precision Engineering, pp. 671-672.
  7. Syed, R., 2005, Handbook of Photomask Manufacturing Technology, CRC press, 1st edition, USA, pp. 44-51.
  8. Ham, Y. M., Lee, C. B., Seo, T. W., Chun, K. J., and Cho, K. S., 1996, "Development parameter measurement and profile analysis of electron beam resist for lithography simulation," Journal of IEEK, Vol. 33A, No. 7, pp. 1396-1402.
  9. Parikh, M., and Kyser, D. F., 1979, "Energy deposition functions in electron resist films on substrates," J. App. Phys., Vol. 50, Issue 2, pp. 1104-1111.
  10. Vieu, C., Pepin, A., Chen, Y., Mejias, M., Lebib, A., Manim-Ferlazzo, L., Couraud, L., and Launios, H., 2000, "Electron beam lithography resolution limits and applications," Applied Surface Science, Vol. 164, pp. 111-117.
  11. Rishton, S. A. and Kern, D. P., 1987, "Point exposure distribution measurements for proximity correction in electron beam lithography on a sub- 100 nm scale," J. Vac. Sci. Technol. B, Vol. 5, No. 1, pp. 135-141.
  12. Parikh, M., 1979, "Corrections to proximity effects in electron beam lithography. I. Theory," Journal of Applied Physics, Vol. 50, No. 6, pp. 4371-4377.
  13. Chang, T. H. P., 1975, "Proximity Effect in E-beam Lithography," J. Vac. Sci. Technol., Vol. 12, Issue 6, pp. 1271-1275.