Growth of semi-polar (1-101) InGaN/GaN MQW structures on $8^{\circ}$ off -axis (100) patterned Si substrate by MOVPE

$8^{\circ}$-off (100) Si 기판위의 반극성을 가지는 (1-101) InGaN/GaN 다중양자우물 구조의 MOVPE 성장

  • Han, Y.H. (Department of Applied Science, Korea Maritime University) ;
  • Jean, H.S. (Department of Applied Science, Korea Maritime University) ;
  • Hong, S.H. (Department of Applied Science, Korea Maritime University) ;
  • Kim, E.J. (Department of Applied Science, Korea Maritime University) ;
  • Lee, A.R. (Department of Applied Science, Korea Maritime University) ;
  • Kim, K.H. (Department of Applied Science, Korea Maritime University) ;
  • Ahn, H.S. (Department of Applied Science, Korea Maritime University) ;
  • Yang, M. (Department of Applied Science, Korea Maritime University) ;
  • Tanikawa, T. (Department of Electronics, Nagoya University) ;
  • Honda, Y. (Department of Electronics, Nagoya University) ;
  • Yamaguchi, M. (Department of Electronics, Nagoya University) ;
  • Sawaki, N. (Department of Electronics, Nagoya University)
  • 한영훈 (한국해양대학교 반도체 물리) ;
  • 전헌수 (한국해양대학교 반도체 물리) ;
  • 홍상현 (한국해양대학교 반도체 물리) ;
  • 김은주 (한국해양대학교 반도체 물리) ;
  • 이아름 (한국해양대학교 반도체 물리) ;
  • 김경화 (한국해양대학교 반도체 물리) ;
  • 안형수 (한국해양대학교 반도체 물리) ;
  • 양민 (한국해양대학교 반도체 물리) ;
  • ;
  • ;
  • ;
  • Published : 2009.02.28

Abstract

In this study, we performed growth of InGaN/GaN multi quantum well (MQW) structures on semi-polar (1-10]) GaN facet on 8-degree off oriented stripe patterned (100) Si substratcs by MOVPE. The structural and optical properties of the InGaN/GaN multi quantum well (MQW) structures grown on (1-101) GaN stripe depend on $NH_3$ flow rate, TMI flow rate and growth temperature are characterized by cathodoluminescence (CL) and scanning electron microscopy (SEM). With the decrease of $NH_3$ flow rate, the threading dislocation of (1-101) GaN is considerably reduced. We could control the transition wavelength of InGaN/GaN MQW structures from 391.5 nm to 541.2 nm depend on the growth conditions.

본 연구에서는 metal organic vapor phase epitaxy(MOVPF) 방법으로 $8^{\circ}$-off (100) Si 기판 위에 분극이 완화된(1-101) GaN를 성장한 후 광소자로서의 가능성을 확인하고자 (1-101) GaN 위에 InGaN/GaN MQW 구조를 제작하였으며 암모니아 유량, TMI 유랑 그리고 성장 온도 등 다양한 성장 조건에 따른 구조적, 광학적인 특성을 scanning electron microscopy(SEM)와 cathodoluminescence(CL)을 통하여 관찰하였다. (1-101) GaN 성장시 암모니아 유량이 적을수록 관통전위가 현저히 줄어드는 것을 확인하였다. (1-101) GaN stripe 위에 성장 시킨 InGaN/GaN MQW 구조를 이용하여 성장조건에 따라서 391.5nm부터 541.2nm에 이르는 넓은 영역의 범위에서 발광 스펙트럼을 조절할 수 있음을 확인하였다.

Keywords

References

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