Effect of Boundary Slip Phenomena in Nanoimprint Lithography Process

나노임프린트 리소그래피 공정에서 Slip에 의한 경계 효과

  • 이영훈 (서울대 대학원 기계항공공학부) ;
  • 김남웅 (동양공업전문대학 기계공학부) ;
  • 신효철 (서울대학교 기계항공공학부)
  • Published : 2009.04.15

Abstract

It is widely known that no-slip assumptions are often violated on regular basis in micrometer- or nanometer-scale fluid flow. In the case of cavity-filling process of nanoimprint lithography(NIL), slip phenomena take place naturally at the solid-to-liquid boundaries, that is, at the mold-to-polymer or polymer-to-substrate boundaries. If the slip or partial slip phenomena are promoted at the boundaries, the processing time of NIL, especially of thermal-NIL which consumes more tact time than that of UV-NIL, can be significantly improved. In this paper it is aimed to elucidate how the cavity-filling process of NIL can be influenced by the slip phenomena at boundaries and to what degree those phenomena increase the process rate. To do so, computational fluid dynamics(CFD) analysis of cavity filling process has been carried out. Also, the effect of mold pattern shape and initial thickness of polymer resist were considered in the analysis, as well.

Keywords

References

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