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무전해 코발트계 석출막에 미치는 기판의 영향

Effect of Substrate on Electroless Co-Base Deposited Films

  • 한창석 (호서대학교 국방과학기술학과) ;
  • 천창환 (호서대학교 국방과학기술학과) ;
  • 한승오 (호서대학교 융합기술연구소)
  • Han, Chang-Suk (Dept. of Defense Science & Technology, Hoseo University) ;
  • Chun, Chang-Hwan (Dept. of Defense Science & Technology, Hoseo University) ;
  • Han, Seung-Oh (Institute of Fusion Technology, Hoseo University)
  • 발행 : 2009.06.27

초록

The deposition behavior and structural and magnetic properties of electroless Co-B and Co-Fe-B deposits, as well as the amorphous ribbon substrates, were investigated. These Co-based alloy deposits exhibited characteristic polycrystalline structures and surface morphology and magnetic properties that were dependent on the type of amorphous substrates. The catalytic activity sequence of the amorphous ribbon electrodes for anodic oxidation of DMAB was estimated from the current density-potential curve in the anodic partial electrolytic bath that did not contain the metal ions. Both the deposition rate and potential in the initial region were obtained in order of the catalytic activity, depending on the alloy compositions of the substrates. The deposition rate linearly varied against the deposition time. The initial deposition potential may have also determined the structural and magnetic properties of the deposit based on the thickness of ${\mu}m$ order. Furthermore, a basic study of the electroless deposition processes on an amorphous ribbon substrate has been carried out in connection with the structural and magnetic properties of the deposits.

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