The Transactions of The Korean Institute of Electrical Engineers (전기학회논문지)

The Korean Institute of Electrical Engineers (대한전기학회)
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Study of Transient Response in Non-uniform Plasma Layer with Optically-Controlled Microwave Pulses

광-마이크로파 기반 유도플라즈마의 과도응답 특성에 관한 연구

  • 왕설 (원광대학교 전자재료공학과) ;
  • 최유순 (원광대학교 컴퓨터공학부) ;
  • 박종구 (원광대학교 컴퓨터공학부) ;
  • 김용갑 (원광대학교 정보통신공학과)
  • Published : 2009.06.01
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Abstract

In this paper we develop the characteristic of density on non-uniform plasma in different layer of the semiconductor with optically controlled microwave pulses. The transient response of the microwave pulses in different plasma layer has been evaluated by calculating the variation of the reflection function of dielectric microstrip lines. The lines has used under open-ended termination containing optically induced plasma region, which has illuminated a laser source. The characteristics impedances resulting from the presence of plasma are evaluated by the transmission line model. The analyzes the variation of transient response in a 0.01cm layer near the surface for frequency range from 1GHz to 128GHz. The diffusion length LD is larger than compared to the absorption depth $l/_{\alpha}l$. The variation of characteristic response in plasma layer with microwave pulses which has in deferentially localized has been evaluated analytically.

Keywords

References

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