Abstract
We developed a line standards measurement system using an optical microscope and measured two kinds of line standards. It consists of three main parts: an optical microscope module including a CCD camera, a stage system with a linear encoder, and a measurement program for a microscopic image processing. The magnification of microscope part was calibrated using one-dimensional gratings and the angular motion of stage was measured to estimate the Abbe error. The threshold level in line width measurement was determined by comparing with certified values of a line width reference specimen, and its validity was proved through the measurement of another line width specimen. The expanded uncertainty (k=2) was about 100 nm in the measurements of $1{\mu}m{\sim}10{\mu}m$ line width. In the comparison results of line spacing measurement, two kinds of values were coincide within the expanded uncertainty, which were obtained by the one-dimensional measuring machine in KRISS and the line standards measurement system. The expanded uncertainty (k=2) in the line spacing measurement was estimated as $\sqrt{(0.098{\mu}m)^2+(1.8{\times}10^{-4}{\times}L)^2}$. Therefore, it will be applied effectively to the calibration of line standards, such as line width and line spacing, with the expanded uncertainty of several hundreds nanometer.
