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Erosion Behavior of YAG Ceramics under Fluorine Plasma and their XPS Analysis

불소계 플라즈마에 노출된 YAG 세라믹스의 식각거동 및 XPS 분석

  • Kim, Kyeong-Beom (Korea Institute of Ceramic Engineering and Technology(Icheon)) ;
  • Kim, Dae-Min (Korea Institute of Ceramic Engineering and Technology(Icheon)) ;
  • Lee, Jung-Ki (School of Materials Engineering, Inha University) ;
  • Oh, Yoon-Suk (Korea Institute of Ceramic Engineering and Technology(Icheon)) ;
  • Kim, Hyung-Tae (Korea Institute of Ceramic Engineering and Technology(Icheon)) ;
  • Kim, Hyung-Sun (School of Materials Engineering, Inha University) ;
  • Lee, Sung-Min (Korea Institute of Ceramic Engineering and Technology(Icheon))
  • 김경범 (한국세라믹기술원 이천분원 엔지니어링세라믹센터) ;
  • 김대민 (한국세라믹기술원 이천분원 엔지니어링세라믹센터) ;
  • 이정기 (인하대학교 신소재공학부) ;
  • 오윤석 (한국세라믹기술원 이천분원 엔지니어링세라믹센터) ;
  • 김형태 (한국세라믹기술원 이천분원 엔지니어링세라믹센터) ;
  • 김형순 (인하대학교 신소재공학부) ;
  • 이성민 (한국세라믹기술원 이천분원 엔지니어링세라믹센터)
  • Published : 2009.09.30

Abstract

Chemical composition and status of chemical bonding of the YAG($Y_3Al_5O_{12}$) ceramics after the exposure to fluorine plasma have been investigated using X-ray photoelectron spectroscopy, with the analysis on its erosion behavior. On the surface, F showed the maximum content, decreasing with depth, meanwhile the cation composition remained almost constant, irrespective of the position. The peaks due to Y in the reaction layer consisted of two kinds, showing the Y-O and Y-F bonds. These surface modifications under fluorine plasma seem to promote the erosion of the YAG ceramics. Excess addition of $Al_2O_3$ or $Y_2O_3$ into stoichiometric YAG produced 2nd phases of $Al_2O_3$ and $YAlO_3$, respectively, resulting in the slight difference in the local erosion rates. But, the overall average erosion rate was not sensitive to such excess additions of $Al_2O_3$ or $Y_2O_3$.

Keywords

References

  1. G. S. May and C. J. Spanos, “Fundamentals of Semicon-ductor Manufacturing and Process Control,” pp. 98-102, John Wiley & Sons, Inc., New Jersey, 2006
  2. A. J. V. Roosmalen, J. A. G. Baggerman, and S. J. H. Brader, “Dry Etching for VLSI,” pp. 39-69, Plenum Press, New York and London, 1991
  3. D-M. Kim, S-Y. Yoon, K-B. Kim, H-S. Kim, Y-S. Oh, and S-M. Lee, “Plasma Resistance of Yttria Deposited by EBPVD Method(in Korean),” J. Kor. Ceram. Soc., 45 [11] 707- 12 (2008) https://doi.org/10.4191/KCERS.2008.45.1.707
  4. D-M. Kim, S-M. Lee, S-W. Kim, H-T. Kim, and Y-S. Oh, “Microstructural Changes of the $Al_2O_3$ Ceramics during the Exposure to Fluorine Plasma(in Korean),” J. Kor. Ceram. Soc., 45 [7] 405-10 (2008) https://doi.org/10.4191/KCERS.2008.45.7.405
  5. D-M. Kim, K-B. Kim, S-Y. Yoon, Y-S. Oh, H-T. Kim, and S-M. Lee, “Effects of Artificial Pores and Purity on the Erosion Behaviors of Polycrystalline $Al_2O_3$ Ceramics under Fluorine Plasma,” J. Ceram. Soc. Jpn., 117 [8] 863-7 (2009) https://doi.org/10.2109/jcersj2.117.863
  6. K. Morita, H. Ueno, and H. Murayama, “Plasma Resistant Articles and Production Method Thereof,” US patent 6933254 (2005)
  7. A. Miyazaki, K. Morita, S. Nagasaka, and S. Moriya, “Plasma Resistant Member and Plasma Treatment Apparatus Using the Same,” US patent 6834613 (2004)
  8. R. J. O'Donnell, J. E. Daugherty, and C. C. Chang, “Boron Nitride/Yttria Composite Components of Semiconductor Processing Equipment and Method of Manufacturing Thereof,” US patent 6773751 (2004)
  9. Y. Kobayashi, M. Ichishima, and Y. Yokoyama, “Plasma Resistant Member,” US patent 7090932 (2006)
  10. J. Iwasawa, R. Nishimizu, M. Tokita, M. Kiyohara, and K. Uematsu, “Plasma Resistant Dense Yttrium Oxide Film Prepared by Aerosol Deposition Process,” J. Am. Ceram. Soc., 90 [8] 2327-32 (2007) https://doi.org/10.1111/j.1551-2916.2007.01738.x
  11. J. S, Reed, “Principles of Ceramics Processing,” pp. 141- 142, John Wiley & Sons, Inc., New York, 1995
  12. G. Y. Yeom, “Plasma Etching Technology(in Korean),” pp. 307-345, Miraecom, Seoul, 2006
  13. S. Kohn, W. Hoffbauer, M. Jansen, R. Franke, and S. Bender, “Evidence for the formation of SiON glasses,” J. Non-Crys. Solids, 224 232-43 (1998) https://doi.org/10.1016/S0022-3093(97)00467-5
  14. J. F. Moulder, W. F. Stickle, P. E. Sobol, and K. D. Bomben, “Handbook of X-ray Photoelectron Spectroscopy,” pp. 10- 11, Physical Electronics, Inc., Minnesota, 1995

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