ETRI Journal

  • 제31권4호
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  • Pages.351-356
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  • 2009
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  • 1225-6463(pISSN)
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  • 2233-7326(eISSN)
한국전자통신연구원 (Electronics and Telecommunications Research Institute)
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Nanogap Array Fabrication Using Doubly Clamped Freestanding Silicon Nanowires and Angle Evaporations

  • Yu, Han-Young (Convergence Components and Materials Research Laboratory, ETRI) ;
  • Ah, Chil-Seong (IT Convergence Technology Research Laboratory, ETRI) ;
  • Baek, In-Bok (IT Convergence Technology Research Laboratory, ETRI) ;
  • Kim, An-Soon (IT Convergence Technology Research Laboratory, ETRI) ;
  • Yang, Jong-Heon (IT Convergence Technology Research Laboratory, ETRI) ;
  • Ahn, Chang-Guen (IT Convergence Technology Research Laboratory, ETRI) ;
  • Park, Chan-Woo (IT Convergence Technology Research Laboratory, ETRI) ;
  • Kim, Byung-Hoon (Convergence Components and Materials Research Laboratory, ETRI)
  • 투고 : 2009.01.16
  • 심사 : 2009.04.20
  • 발행 : 2009.08.30
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초록

We present a simple semiconductor process to fabricate nanogap arrays for application in molecular electronics and nano-bio electronics using a combination of freestanding silicon nanowires and angle evaporation. The gap distance is modulated using the height of the silicon dioxide, the width of the Si nanowires, and the evaporation angle. In addition, we fabricate and apply the nanogap arrays in single-electron transistors using DNA-linked Au nanoparticles for the detection of DNA hybridization.

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참고문헌

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