DOI QR코드

DOI QR Code

Study on the Characteristic due to the Various Polarity based on the Carbon Contents in Organic Thin Film

유기물 박막에서 탄소 함량에 따라서 달라지는 분극의 변화에 따른 특성 변화에 대한 연구

  • Received : 2010.03.04
  • Accepted : 2010.09.03
  • Published : 2010.09.30

Abstract

The diluted PMMA treated $SiO_2$ films as an passivation materials for semiconductor devices was researched by using the FTIR spectra. The diluted PMMA solution with various ratios changed the surface of $SiO_2$ film as the hydrophilic, hydrophobic or hybrid type properties. The sample 7 with little carbon content showed dramatically the chemical variation by the FTIR spectra analysis. Beacuse the little carbon with electrons decreased the polarity and surface energy on the $SiO_2$ film, and then became a stable bonding structure and decreased the leakage current. The FTIR spectra can define the detail variation due to the chemical reaction on the organic thin film, and help to research the characteristic of the organic materials.

유기박막 반도체 소자에서 주로 보호막으로 사용되는 PMMA 코팅 박막의 특성에 대하여 FTIR 분석법을 이용하여 조사하였다. 희석된 PMMA 혼합액은 비율에 따라서 $SiO_2$ 박막의 표면을 친수성, 소수성 혹은 하이브리드 특성으로 변화시켰다. FTIR 분석에 의하여 탄소의 함량이 적은 샘플 7에서 화학적인 변화가 크게 일어나는 것을 확인하였다. 전자를 많이 포함한 소량의 탄소가 $SiO_2$ 박막의 분극성을 감소시키고 박막의 표면에너지를 감소시켜서 화학적으로 안정된 박막의 표면을 형성하여 누설전류가 감소되었다. FTIR 분석은 유기화합물 박막에서 일어나는 화학적 변화에 대하여 미세한 부분까지 측정할 수 있는 척도로서 유용한 분석 방법임을 확인하였다.

Keywords

References

  1. 강만구, 김종대 "플렉시블 염료감응 대양전지 기술" 전기전자재료학회지, 제19권 7호, p. 39, 7월 2006.
  2. Teresa Oh, H. B. Kim, "Pentacene thin film trasnsistors on PMMA treated SiO2," Transactions on Electrical and Electronic Materials, Vol. 7, No. 7, p. 639-645, December 2006.
  3. P. W. May, S. Hohn, W. N, Wang and N. A. Fox, "Field emission conduction mechanisms in chemical vapor deposited diamond and diamondlike carbon films," Appl. Phys. Lett. vol.27, pp. 2182-2184, 1998.
  4. Ioannis Kymissis, C. D. Dimitrakopoulos and Sampath Purushothaman, "High-Performance Bottom Electrode Organic Thin-Film Transistors," IEEE TRANSACTIONS ON ELECTRON DEVICES, Vol.48, pp.1060-1064, 2001. https://doi.org/10.1109/16.925226
  5. D. J. Gundlach, Y. Y. Lin, T. N. Jackson, S. F. Nelson and D. G. Schlom, "Pentacene Organic Thin-Film Transistors-Molecular Ordering and Mobility, " IEEE ELECTRON DEVICE LETTERS, 18, (1997) 87-89. https://doi.org/10.1109/55.556089
  6. M. A. Tamor and C. H. Wu, "Graphitic network models of diamondlike carbon," J. Appl. Phys, Vol. 67, pp. 1007-1012, Jan. 1990. https://doi.org/10.1063/1.345808
  7. J. Frenkel, "On pre-breakdown phenomena in insulators and electronic semiconductors," Phys. Rev. 54, pp. 647-648, 1938. https://doi.org/10.1103/PhysRev.54.647
  8. Jin Yong Kim, Moo Sung Hwang, Yoon-Hae Kim, and Hyeong Joon Kim, Young Lee, "Origin of low dielectric constant of carbon-incorporated silicon oxide film deposited by plasma enhanced chemical vapor deposition," J. Appl. Phys. Vol. 90, pp. 2469-2473, 2001. https://doi.org/10.1063/1.1388861
  9. Jong-Ho YUN, Eun-Seok CHOI, Choel-Min JANG and Choon-Soo LEE, "Effect of post-treatments on atomic layer deposition of TiN thin films using tetrakis (dimethylamido) titanium and ammonia,"Jpn. J. Appl. Phys. Vol. 41, pp. L418-L421, 2002. https://doi.org/10.1143/JJAP.41.L418
  10. J. R. Kalnin and E. Kotomin, "Modified Maxwell-Garnett equation for the effective transport coefficients in inhomogeneous media," J. Phys. A:Math. Gen. Vol. 31, pp.7227-7234, 1998. https://doi.org/10.1088/0305-4470/31/35/004
  11. P. R. Emtage and W. Tantraporn, "Schottky emission through thin inslulating films," Physical Review letters, Vol. 8, No. 7, pp. 267-268, 1962. https://doi.org/10.1103/PhysRevLett.8.267
  12. J. G. Simmons, "Pools-Frenkel Effect and Schottky in Metal-Insuloror-Metal Systems," Physial Review, vol. 155, pp. 657-660, 1967. https://doi.org/10.1103/PhysRev.155.657
  13. C. A. Mead, "Electron Transport Mechanism in Thin Insulating Films," Physical Review, vol. 128, pp. 2088-2093, 1962. https://doi.org/10.1103/PhysRev.128.2088
  14. Giulia Galli and Richard M. Martin, "Structural and electronic properties of amorphous carbon," Phys. Rev. Lett. 62(5), pp. 555-558, 1989. https://doi.org/10.1103/PhysRevLett.62.555
  15. Teresa Oh, "Comparision between organic thin films deposited by using CCP-CVD and ICP-CVD," J. Korean Phys. Soc. Vol. 55, pp. 1950-1954, 2009. https://doi.org/10.3938/jkps.55.1950