Journal of the Korean Institute of Electrical and Electronic Material Engineers (한국전기전자재료학회논문지)

The Korean Institute of Electrical and Electronic Material Engineers (한국전기전자재료학회)
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Preparation of La0.6Sr0.4MnO3 Thin Films by RF Magnetron Sputtering and Their Microstructure and Electrical Conduction Properties

RF 스퍼터법을 사용한 La0.6Sr0.4MnO3 박막 제조 및 미세구조와 전기전도 특성

  • 박창순 (군산대학교 신소재공학과) ;
  • 선호정 (군산대학교 신소재공학과)
  • Published : 2010.04.01
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Abstract

We fabricated $La_{0.6}Sr_{0.4}MnO_3$ thin films using radio frequency (RF) magnetron sputtering. They were grown on sapphire substrates with various deposition conditions. After the growth of the $La_{0.6}Sr_{0.4}MnO_3$ thin films, they were annealed at various temperatures to be crystallized. We successfully fabricated single phase $La_{0.6}Sr_{0.4}MnO_3$ thin films with high electrical conductivity. The room temperature resistivity was $1.5{\times}10^{-2}{\Omega}{\cdot}cm$. It can be considered that $La_{0.6}Sr_{0.4}MnO_3$ thin films are one of the feasible candidates for electrodes for integrated device applications.

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References

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