Journal of the Korean Society for Precision Engineering (한국정밀공학회지)

Korean Society for Precision Engineering (한국정밀공학회)
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Direct Patterning of 3D Microstructures on an Opaque Substrate Using Nano-Stereolithography

나노 스테레오리소그래피 공정을 이용한 불투명 기판에서의 3차원 마이크로 형상 제작 방법에 관한 연구

  • 손용 (한국과학기술원 기계항공시스템학부) ;
  • 임태우 (한국과학기술원 기계항공시스템학부) ;
  • 하철우 (한국과학기술원 기계항공시스템학부) ;
  • 양동열 (한국과학기술원 기계항공시스템학부) ;
  • 정병제 (한국과학기술원 물리학과) ;
  • 공홍진 (한국과학기술원 물리학과)
  • Received : 2010.04.16
  • Accepted : 2010.08.10
  • Published : 2010.10.01
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Abstract

A nano-stereolithography is the direct patterning process with a nanoscale resolution using twophoton absorption induced by a femtosecond laser. However, in the majority of the works, the fabrication of 3D microstructures have been done only onto transparent glass due to the use of an oil immersion objective lens for achieving a high resolution. In this work, the coaxial illumination and the auto-focusing system are proposed for the direct patterning of nano-precision patterns on an opaque substrate such as a silicon wafer and a metal substrate. Through this work, 3D polymer structures and metallic patterns are fabricated on a silicon wafer using the developed process.

Keywords

References

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