DOI QR코드

DOI QR Code

Experimental Study on the Control Characteristics of Each Channel in a Semiconductor Chiller

반도체 공정용 칠러의 채널별 제어특성에 관한 실험적 연구

  • Kim, Hyeon-Joong (Dept. of Mechanical Engineering, Korea Univ.) ;
  • Kwon, Oh-Kyung (Energy System R&D Group, Korea Institute of Industrial Technology) ;
  • Cha, Dong-An (Energy System R&D Group, Korea Institute of Industrial Technology) ;
  • Kim, Yong-Chan (Dept. of Mechanical Engineering, Korea Univ.)
  • 김현중 (고려대학교 기계공학과) ;
  • 권오경 (한국생산기술연구원 에너지시스템연구그룹) ;
  • 차동안 (한국생산기술연구원 에너지시스템연구그룹) ;
  • 김용찬 (고려대학교 기계공학과)
  • Received : 2011.04.05
  • Accepted : 2011.09.15
  • Published : 2011.12.01

Abstract

The characteristics of a semiconductor chiller system with EEV have been experimentally studied. Three experiments on temperature changes (increase and decrease), load variation, and control precision were conducted to investigate the operating characteristics of the semiconductor chiller. The power consumption was 8.9 kW during increase in temperature. The required time was 37.5 min for CH1 and 39.5 min for CH2. Moreover, the time required for falling temperature was 26.5 min. The control precision for partial load operation was relatively low compared to that of a full load operation. In addition, the CH2 equipped with a step motor showed better control precision. The power consumed by the chiller for process cooling water was 1.8 kW, which was one-half of that consumed during the refrigeration cycle. The objective of this study is to provide an optimal control guideline for the semiconductor chiller design.

본 연구에서는 전자식 팽창밸브를 적용한 반도체 공정용 칠러에 관한 실험적 연구를 통해 시스템 특성을 파악하였다. 또한 온도 변화에 따른 신속한 대응을 할 수 있도록 온도상승 및 하강실험, 부하변화에 따른 온도영역별 제어정밀도 실험을 함으로써 각 제어 방식에 따른 운전 특성을 파악하였다. 온도상승 시 소비전력은 8.9 kW로 측정되었으며 CH1이 37.5분, CH2가 39.5분이 소요되었으며, 온도하강에는 총 26.5분이 소요되었다. 부분부하가 적용되는 경우 전부하가 적용되는 경우에 비해 제어정밀도의 변화폭이 큰 것으로 나타났으며 스텝모터 구동방식을 적용한 CH2의 제어정밀도가 상대적으로 우수한 것으로 나타났다. 냉각수를 이용한 냉각사이클 영역에서 소비전력은 1.8 kW로 냉동사이클을 적용한 방식에 비해 절반가량으로 감소된 것으로 나타났다. 본 연구는 실험결과를 바탕으로 반도체 공정용 칠러의 최적제어방안을 제시하였다.

Keywords

References

  1. KISTI, 2009, "State of Art Technology in Semiconductor Equipment," pp. 1-36
  2. Cha, D. A., Kwon, O. K., Yun, J. H. and Kim, D. Y., 2010, "An Experimental Study on Semi-conductor Process Chiller for Energy Saving," Proceeding of the KSME Spring Annual Conference, pp. 371-376.
  3. Cha, D. A. and Kwon, O. K., 2010, "An Study on Semiconductor Process Chiller with Variation of Control Methods," Proceeding of the KSME Autumn Annual Conference, pp. 2632-2637.
  4. Cha, D. A. and Kwon, O. K., 2010, "An Experimental Study on Semiconductor Process Chiller for Dual Channel," Trans. of the SAREK Vol. 22, No. 11, pp. 760-766.
  5. Cha, D. A., Kwon, O. K. and Oh, M. D., 2010, "An Experimental Study on Process Chiller for Semiconductor Temperature Control," Trans. of the KSME (B) Vol. 35, No. 5, pp. 459-465. https://doi.org/10.3795/KSME-B.2011.35.5.459
  6. Holman, J.P., 2000, "Experimental Method for Engineer," 7th ed., McGraw-Hill, pp. 51-60.