Journal of the Korean Ceramic Society (한국세라믹학회지)

The Korean Ceramic Society (한국세라믹학회)
권호 표지
DOI QR코드

DOI QR Code

Growing Behavior of Nanocrystalline TiN Films by Asymmetric Pulsed DC Reactive Magnetron Sputtering

비대칭 펄스 DC 반응성 마그네트론 스퍼터링으로 증착된 나노결정질 TiN 박막의 성장거동

  • Han, Man-Geun (Department of Advanced Materials Science and Engineering, Mokpo National University) ;
  • Chun, Sung-Yong (Department of Advanced Materials Science and Engineering, Mokpo National University)
  • 한만근 (목포대학교 신소재공학과) ;
  • 전성용 (목포대학교 신소재공학과)
  • Received : 2011.07.19
  • Accepted : 2011.08.31
  • Published : 2011.09.30
Download PDF
⟨ Previous Next ⟩

Abstract

Nanocrystalline TiN films were deposited on Si(100) substrate using asymmetric pulsed DC reactive magnetron sputtering. We investigated the growing behavior and the structural properties of TiN films with change of duty cycle and pulsed frequency. Grain size of TiN films were decreased from 87.2 nm to 9.8 nm with decrease of duty cycle. The $2{\theta}$ values for (111) and (200) crystallographic planes of the TiN films were also decreased with decrease of duty cycle. This shift in $2{\theta}$ could be attributed to compressive stress in the TiN coatings. Thus, the change of plasma parameter has a strong influence not only on the microstructure but also on the residual stresses of TiN films.

Keywords

References

  1. F. Vaz, J. Ferreira, E. Riberio, L. Rebouta, S. Lanceros-Mendez, J. A. Mendes, E. Alves, Ph. Goudeau, et. Al., "Influence of Nitrogen Content on the Structural, Mechanical and Electrical Properties of TiN Thin Films," Surf. Coat. Tech., 191 [2] 317-23 (2005). https://doi.org/10.1016/j.surfcoat.2004.01.033
  2. A. Kagiyama, K. Terakadoa, and R. Uraob, "Effect of Nitriding and TiN Coating Temperatures on the Corrosion Resistance of the Combined Surface Modification Layer," Surf. Coat. Tech., 169-170 [6] 397-400 (2003). https://doi.org/10.1016/S0257-8972(03)00134-8
  3. J. W. Uhm and H. T. Joen, "TiN Diffusion Barrier Grown by Atomic Layer Deposition Method for Cu Metallization," Jpn. J. Appl. Phys., 40 [7] 4657-60 (2001). https://doi.org/10.1143/JJAP.40.4657
  4. W. D. Sproul, J. E. Greene, and J. A. Thornton (Eds), "Physics and Chemistry of Protective Coatings", pp. 50-57, American Institute of Physics, 1986.
  5. N. Y. Kim, Y. B. Son, J. H. Oh, C. K. Hwangbo, and M. C. Park, "TiNx Layer as an Antireflection and Antistatic Coating for Display," Surf. Coat. Tech., 128-129 [6] 156-60 (2000). https://doi.org/10.1016/S0257-8972(00)00574-0
  6. Y. S. Kim, H. Jone, and Y. D. Kim, "Atomic Layer Chemical Vapor Deposition of TiN Thin Films on Si(100) and Si(111)," J. Kor. Phys. Soc., 37 [6] 1045-50 (2000). https://doi.org/10.3938/jkps.37.1045
  7. C. Rebholz, A. Leyland, P. Larour, C. Charitidis, S. Logothetidis, and A. Matthews, "The Effect of Boron Additions on the Tribological Behavior of TiN Coating Produced by Electron Beam Evaporative PVD," Surf. Coat. Tech., 116-119 [9] 648-53 (1999). https://doi.org/10.1016/S0257-8972(99)00260-1
  8. M. Katayama, "TFT-LCD Technology," Thin Solid Films, 341 [1] 140-47 (1999). https://doi.org/10.1016/S0040-6090(98)01519-3
  9. J. Sellers, "Asymmetric Bipolar Pulsed DC : The Enabling Technology for Reactive PVD," Surf. Coat. Tech., 98 [1] 1245-50 (1998). https://doi.org/10.1016/S0257-8972(97)00403-9
  10. H. D. Ko, C.S. Lee, W. P. Tai, S. J. She, and Y. S. Kim, "Effect of Pulse Frequency on the Properties of ZnO : Al Thin Films Prepared by Pulsed DC Magnetron Sputtering," J. Kor. Ceram. Soc., 41 [6] 476-80 (2004). https://doi.org/10.4191/KCERS.2004.41.6.476
  11. J. H. Kim, J. K. Lee, and J. H. Ahn, "Growing Behavior of AlN Thin Film Deposited by Asymmetric Bipolar Pulsed DC Reactive Sputtering," J. Kor. Ceram. Soc., 38 [1] 61-67 (2001).
  12. W. D. Sproul, "High-rate Reactive DC Magnetron Sputtering of Oxide and Nitride Super Lattice Coatings," J. Vac. Sci. Tech., 51 [4] 641-46 (1998).
  13. J. W. Lee, S. K. Tien, Y. C. Kuo, "The Effects of Substrate Bias, Substrate Temperature and Pulse Frequency on the Microstructure of Chromium Nitride Coating Deposited by Pulsed Direct Current Reactive Magnetron Sputtering," J. Elec. Mater., 34 [12] 1484-92 (2005). https://doi.org/10.1007/s11664-005-0155-9
  14. B. D. Cullity and S. R. Stock, "Element of X-Ray Diffraction", 3rd. ED., pp. 167-71 Prentice-Hall Inc., 2001.
  15. I. Petrov, P. B. Barna, L. Hultman, and J. E. Greene, "Microstructural Evolution During Film Growth," J. Vac. Sci. Tech. A, 21 [5] 774-56 (2003).
  16. S. Y. Chun "Microstructure and Mechanical Properties of Nanocrystalline TiN films Through Increasing Substrate Bias," J. Kor. Ceram. Soc., 47 [6] 479-84 (2010). https://doi.org/10.4191/KCERS.2010.47.6.479
  17. N. Maazi and N. Rouag, "Consideration of Zener Drag Effect by Introducing a Limiting Radius for Neighbourhood in Grain Growth Simulation," J. Cryst. Growth, 243 [2] 361-69 (2002). https://doi.org/10.1016/S0022-0248(02)01420-3
  18. I. Petrov, L. Hultman, U. Helmersson, S. A. Barnett, J. E. Sundgern, and J. E. Green, "Microstructure Modification of TiN by Ion Bombardment during Reactive Sputtering Deposition," Thin Solid Films, 169 [2] 299-314 (1989). https://doi.org/10.1016/0040-6090(89)90713-X
  19. Harish, C. Barshilia, and K. S. Rajam, "Reactive Sputtering of Hard Nitride Coatings Using Asymmetric Bipolar Pulsed DC Generator," Surf. Coat. Tech., 201 [3] 1827-35 (2006). https://doi.org/10.1016/j.surfcoat.2006.03.012

Cited by

  1. A Comparative Study of CrN Coatings Deposited by DC and Pulsed DC Asymmetric Bipolar Sputtering for a Polymer Electrolyte Membrane Fuel Cell (PEMFC) Metallic Bipolar Plate vol.50, pp.6, 2013, https://doi.org/10.4191/kcers.2013.50.6.390
  2. A Comparative Study of Nanocrystalline TiAlN Coatings Fabricated by Direct Current and Inductively Coupled Plasma Assisted Magnetron Sputtering vol.51, pp.5, 2014, https://doi.org/10.4191/kcers.2014.51.5.375
  3. Effects of Duty Cycle and Pulse Frequency on the Microstructure and Mechanical Properties of TiAlN Coatings vol.51, pp.5, 2014, https://doi.org/10.4191/kcers.2014.51.5.447
  4. Properties of VN Coatings Deposited by ICP Assisted Sputtering: Effect of ICP Power vol.54, pp.1, 2017, https://doi.org/10.4191/kcers.2017.54.1.05
  5. 유도결합 플라즈마 파워변화에 따른 초경도 나노결정질 TiN 코팅막의 물성변화 vol.50, pp.3, 2011, https://doi.org/10.4191/kcers.2013.50.3.212
  6. 에너지 반환회로를 갖는 비대칭 펄스형 DC 플라즈마 전원장치에 관한 연구 vol.18, pp.6, 2013, https://doi.org/10.6113/tkpe.2013.18.6.593
  7. Grain Size and Phase Transformation Behavior of TiNi Shape-Memory-Alloy Thin Film under Different Deposition Conditions vol.13, pp.14, 2020, https://doi.org/10.3390/ma13143229
  8. Characteristics of HfN coatings by inductively coupled plasma-assisted magnetron sputtering vol.58, pp.2, 2011, https://doi.org/10.1007/s43207-020-00084-3