Korean Journal of Optics and Photonics (한국광학회지)

Optical Society of Korea (한국광학회)
권호 표지
DOI QR코드

DOI QR Code

Study on Polarization Characteristics of Optical Device and Improvement of Measurement Precision of Normal Incidence Ellipsometer for Measuring Optical Anisotropy of a Micro Spot

미소면적 광학이방성 정밀 측정을 위한 수직반사형 타원계의 광소자 편광특성 및 측정정밀도 향상 연구

  • 염경훈 (아주대학교 분자과학기술학과) ;
  • 박상욱 ((주)엘립소테크놀러지) ;
  • 서영진 ((주)엘립소테크놀러지) ;
  • 이민호 ((주)엘립소테크놀러지) ;
  • 김웅기 (한국원자력연구원) ;
  • 김상열 (아주대학교 분자과학기술학과)
  • Received : 2012.10.09
  • Accepted : 2012.11.20
  • Published : 2012.12.25
Download PDF
⟨ Previous Next ⟩

Abstract

A normal incidence ellipsometer is fabricated to measure the optical anisotropy of a small spot whose diameter is less than $8.0{\mu}m$, by adding a beam splitter and a prism to the conventional rotating analyzer type ellipsometer. The polarizing actions of the added optical components are calibrated to improve the accuracy of the anisotropy measurement. The standard deviation of the optical anisotropy factor decreased to 0.00083, and the variation of the optical anisotropy factor of rutile versus sample azimuth angle variation also decreased to 0.015, after adoption of a non-polarizing beam splitter and a quarter wavelength phase retarder, followed by removal of the optical fiber and a careful choice of measurement wavelength.

기존의 반사형 타원계에 광분할기와 프리즘 등의 광학소자를 추가하여 $8.0{\mu}m$ 보다 작은 면적에서 시료의 광학이방성을 측정할 수 있는 수직반사형 타원계를 제작하였다. 수직반사 구조를 구현하기 위해 사용된 광학소자들의 편광작용을 보정하여 광학이방성 측정의 정확도를 향상시켰다. 비편광 광분할기를 사용하고 사분파장 위상지연자를 장착하며 광섬유를 제거하고 파장영역을 최적화하여 광학이방성인자 측정값의 표준편차를 0.00083 으로 줄이고 방위각 변화에 따른 rutile 시료의 광학이방성인자의 변동폭을 0.015 이하로 줄일 수 있었다.

Keywords

References

  1. Y. J. Shin and J. H. Chang, "Vision and status of nuclear hydrogen development in Korea," KIC News 10, (2007).
  2. W. K. Kim, Y. W. Lee, and S. W. Ra, "Simulation of the digital image processing algorithm for the coating thickness automatic measurement of the TRISO-coated fuel particle," International Journal of Information Processing Systems 1, 36-40 (2005). https://doi.org/10.3745/JIPS.2005.1.1.036
  3. K. H. Lyum, S. W. Park, and S. Y. Kim, "Optical anisotropy measurement system with a micro spot using PSA ellipsometry at normal incidence," in Proc. The Optical Society of Korea Winter Annual Meeting (Daejeon Convention Center, Daejeon, Korea, 2012), paper TP-II 24.
  4. D. E. Aspnes and A. A. Studna, "Anisotropies in the above-band-gap optical spectra of cubic semiconductors," Phys. Rev. Lett. 54, 1956-1959 (1985). https://doi.org/10.1103/PhysRevLett.54.1956
  5. O. Archer, S. M. Koch, F. Omnes, M. Defour, M. Rezeghi, and B. Drevillon, "In situ investigation of the low pressure metalorganic chemical vapor deposition of lattice mismatched semiconductors using reflectance anisotropy measurements," J. Appl. Phys. 68, 3564-3577 (1990). https://doi.org/10.1063/1.346316
  6. D. E. Aspnes, Y. C. Chang, A. A. Studna, L. T. Florez, H. H. Farrell, and J. P. Harbison, "Direct optical measurement of surface dielectric responses: interrupted growth on (001) GaAs," Phys. Rev. Lett. 64, 192-195 (1990). https://doi.org/10.1103/PhysRevLett.64.192
  7. B. Koopmans, B. Richards, P. Santos, K. Eberl, and M. Cardona, "Inplane optical anisotropy of GaAs/AlAs multiple quantum wells probed by microscopic reflectance difference spectroscopy," Appl. Phys. Lett. 69, 782-784 (1996). https://doi.org/10.1063/1.117890
  8. C. H. Li, Y. Sun, S. B. Visbeck, D. C. Law, and R. F. Hicks, "Reflectance difference spectroscopy of an ultrathin indium arsenide layer on indium phosphide (001)," Appl. Phys. Lett. 81, 3939-3941 (2002). https://doi.org/10.1063/1.1523650
  9. T. D. Kang, G. S. Lee, and H. Lee, "Reflectance difference spectroscopy of CuPt-type ordered $Ga_{0.5}In_{0.5}P/GaAs$," J. Korean Phys. Soc. 47, S485-S488 (2005).
  10. G. E. Jellison Jr. and J. D. Hunn, "Optical anisotropy measurements of TRISO nuclear fuel particle cross-sections: The method," Journal of Nuclear Materials 372, 36-44 (2008). https://doi.org/10.1016/j.jnucmat.2007.02.008
  11. S. Y. Kim, Ellipsometry (Ajou University Press, Gyeonggi, Korea, 2000), pp. 115-120.
  12. J. D. Hunn, "Comparison of characterization methods for anisotropy and microstructure of TRISO particle layers," I-Neri Technical Progress Report (2007).