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Electrodeposition Characteristics of Corrosion Resistant Tantalum Coating Layer for Hydrogen Production Sulfide-Iodine Process

수소생산을 위한 Sulfide-Iodine 공정장치용 초내식 탄탈코팅층 전착특성

  • Lee, Youngjun (Graduate School of Green Energy Technology in Chungnam National University) ;
  • Kim, Daeyoung (Graduate School of Green Energy Technology in Chungnam National University) ;
  • Han, Moonhee (Graduate School of Green Energy Technology in Chungnam National University) ;
  • Kang, Keangsoo (Korea Institute of Energy Research) ;
  • Bae, Gigwang (Korea Institute of Energy Research) ;
  • Lee, Jonghyeon (Graduate School of Green Energy Technology in Chungnam National University)
  • 이영준 (충남대학교 녹색에너지기술전문대학원) ;
  • 김대영 (충남대학교 녹색에너지기술전문대학원) ;
  • 한문희 (충남대학교 녹색에너지기술전문대학원) ;
  • 강경수 (한국에너지기술원) ;
  • 배기광 (한국에너지기술원) ;
  • 이종현 (충남대학교 녹색에너지기술전문대학원)
  • Received : 2012.10.02
  • Accepted : 2012.12.31
  • Published : 2012.12.31

Abstract

Corrosion resistance and basic physical properties of solid tantalum are not comparable to most of the structural metallic materials. The relative high cost and melting temperature of tantalum are obstacles to be widely applied to general engineering processes. Electrodeposition in molten salt enables compact and uniform tantalum coating. In this study, Ta was coated onto base metal (SUS316L) with different current densities (0.5, 5, $20mA/cm^2$) by using MSE (Molten Salt Electrodeposition). In this study, it showed that deposition efficiency and microstructure of Ta coating layer were strongly depended on current density. In the case of the current density of $5mA/cm^2$, densest microstructure was obtained. The current density above $5mA/cm^2$ caused non-uniform microstructure due to rapid deposition rate. Dense microstructure and intact coating layer contributed to significant corrosion resistance enhancement.

Keywords

References

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