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A Study on the Discharge Characteristics of Cylindrical Sputtering Apparatus and Microstructure

원통형 마그네트론 스퍼터링 장비의 방전특성과 박막구조에 관한 연구

  • Oh, Chang-Sup (Korea Institute of Science and Technology Information) ;
  • Han, Chang-Suk (Dept. of Defense Science & Technology, Hoseo University)
  • 오창섭 (한국과학기술정보연구원) ;
  • 한창석 (호서대학교 국방과학기술학과)
  • Received : 2011.11.28
  • Accepted : 2011.12.20
  • Published : 2012.01.30

Abstract

The purpose of this study is to prepare a high strength fiberglass reinforced metal. Aluminum covering was carried out over carbon materials such as carbon fiber in order to increase their wettability to molten metals such as aluminum. A sputtering apparatus with a cylindrical target was fabricated to carry out the covering. Sputtering was caused by glow discharge between the target and the two anode plates attached to its top and bottom. As the substrate for preliminary test, a thin carbon wire was used instead of carbon fiber, and the wire was placed at the central axis of the target. Aluminium coating was formed on the whole surface of the substrate. The formation rate and structure of coating were varied by controlling the electrical potential of substrate. When the substrate was electrically isolated, coating with columnar structure was formed with a formation rate of $15{\mu}m/hr$. In case of grounded substrate, coating with amorphous structure was formed with a formation rate of $7{\mu}m/hr$.

Keywords

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