Journal of the Korean Society for Heat Treatment (열처리공학회지)

The Korean Society for Heat Treatment (한국열처리공학회)
권호 표지
DOI QR코드

DOI QR Code

Post Deposition Annealing Effect on the Structural, Electrical and Optical Properties of ZnO/Ag/ZnO Thin Films

  • Kim, Daeil (School of materials science and engineering, University of Ulsan)
  • Received : 2012.02.16
  • Accepted : 2012.03.21
  • Published : 2012.03.30
Download PDF
⟨ Previous Next ⟩

Abstract

Transparent conductive ZnO/Ag/ZnO (ZAZ) multilayer films were deposited by Radio frequency (RF) magnetron sputtering and direct current (DC) magnetron sputtering. The effects of post deposition vacuum annealing temperature on the structural, electrical and optical properties of the ZAZ multilayer films were investigated. The thickness of ZAZ films is kept constant at ZnO 50 nm/Ag 5nm/ZnO 45 nm, while the vacuum annealing temperatures were varied from 200 and $400^{\circ}C$, respectively. As-deposited ZAZ films exhibit a sheet resistance of $6.1{\Omega}/{\Box}$ and optical transmittance of 72.7%. By increasing annealing temperature to $200^{\circ}C$, the resistivity decreased to as low as $5.3{\Omega}/{\Box}$ and optical transmittance also increased to as high as 82.1%. Post-deposition annealing of ZAZ multilayer films lead to considerably lower electrical resistivity and higher optical transparency, simultaneously by increased crystallization of the films.

Keywords

References

  1. S. Flickyngerova, M. Netrvalova, L. Prusakova, I. Novotny, P. Sutta and V. Tvarozek : Vacuum, 84 (2009) 215-217. https://doi.org/10.1016/j.vacuum.2009.04.006
  2. V. Khranovskyy, U. Grossner, O. Nilsen, V. Lazorenko, G.V. Lashkarev, B.G. Svensson and R. Yakimova : Thin Solid Films, 515 (2006) 472-476. https://doi.org/10.1016/j.tsf.2005.12.269
  3. S. Suzuki, T. Miyata, M. Ishii and T. Minami : Thin Solid Films, 434 (2003) 14-19. https://doi.org/10.1016/S0040-6090(03)00463-2
  4. Daeil Kim : Appl. Surf. Sci., 218 (2003) 71-78. https://doi.org/10.1016/S0169-4332(03)00542-7
  5. G. Fang, D. Li and B. Yao : Vacuum, 68 (2002) 363-372. https://doi.org/10.1016/S0042-207X(02)00544-4
  6. Y. Kim, Y. Lee, S. Heo, H. Lee, J. Kim, S. Kim, J. Chae, J. Choi and Daeil Kim : Optics Comm., 284 (2011) 2303-2306. https://doi.org/10.1016/j.optcom.2010.12.066
  7. Daeil Kim : Displays, 31 (2010) 155-159. https://doi.org/10.1016/j.displa.2010.05.002
  8. Daeil Kim : Appl. Surf. Sci., 256 (2010) 1774-1777. https://doi.org/10.1016/j.apsusc.2009.10.002
  9. B. D. CullityElements of X-ray Diffraction, (Additionwesley, Reading, MA, 1978), 102-121.
  10. C. Yang, S. Lee, T. Lin and S. Chen : Thin Solid Films, 516 (2008) 1984. https://doi.org/10.1016/j.tsf.2007.05.093
  11. J. H. Park, J. H. Chae and Daeil Kim : J. Alloy. Comp., 478 (2009) 330-333. https://doi.org/10.1016/j.jallcom.2008.11.065
  12. G. Haacke : J. Appl. Phys., 47 (1976) 4086-4089. https://doi.org/10.1063/1.323240
  13. H. M. Lee, Y. J. LEE and I. S. Kim : Vacuum, 86 (2012) 1494-1498. https://doi.org/10.1016/j.vacuum.2012.02.041