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기판전압에 따른 나노와이어 Junctionless MuGFET의 전류-전압 특성

Current-Voltage Characteristics with Substrate Bias in Nanowire Junctionless MuGFET

  • 투고 : 2012.02.21
  • 심사 : 2012.03.28
  • 발행 : 2012.04.30

초록

본 연구에서는 고속 및 저전력 스위칭 소자 응용을 위하여 n-채널 무접합 및 반전모드 MuGFET 와 p-채널 무접합 및 축적모드 MuGFET의 기판전압에 따른 전류-전압 특성을 측정하고 비교 분석하였다. 기판전압에 따른 문턱전압과 포화 드레인 전류 변화로부터 n-채널 소자에서는 반전모드 소자가 무접합 소자보다 변화량이 크며 p-채널 소자에서는 무접합 소자가 축적모드 소자보다 변화량이 큰 것을 알 수 있었다. 전달컨덕턴스 변화는 n-채널 소자보다 p-채널 소자의 변화량이 큰 것을 알 수 있었다. 그리고 subthreshold swing 특성으로부터 n-채널 소자와 p-채널 무접합 소자는 기판전압 변화에 따라 S값의 변화가 거의 없지만 p-채널 축적모드 소자는 기판전압이 양의 방향으로 증가할 때 S 값이 증가하는 것으로 관측되었다. 기판전압을 이용한 고속 및 저전력 스위칭 소자 응용 측면에서는 n-채널 소자에서는 반전모드 소자가 p-채널 소자에서는 무접합 소자가 더 좋은 특성을 보였다.

In this paper, a current-voltage characteristics of n-channel junctionless and inversion mode(IM) MuGFET, and p-channel junctionless and accumulation mode(AM) MuGFET has been measured and analyzed for the application in high speed and low power switching devices. From the variation of the threshold voltage and the saturation drain current with the substrate bias voltages, their variations in IM devices are larger than junctionless devices for n-channel devices, but their variations in junctioness devices are larger than AM devices for p-channel devices. The variations of transconductance with substrate biases are more significant in p-channel devices than n-channel devices. From the characteristics of subthreshold swing, it was observed that the S value is almost independent on the substrate biases in n-channel devices and p-channel junctionless devices but it is increased with the increase of the substrate biases in p-channel AM devices. For the application in high speed and low power switching devices using the substrate biases, IM device is better than junctionless devices for n-channel devices and junctionless device is better than AM devices for p-channel devices.

키워드

참고문헌

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