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Forming a Fresnel Zone Lens: Effects of Photoresist on Digital-micromirror-device Maskless Lithography with Grayscale Exposure

  • Huang, Yi-Hsiang (Department of Mechanical Engineering, National Taiwan University of Science and Technology) ;
  • Jeng, Jeng-Ywan (Department of Mechanical Engineering, National Taiwan University of Science and Technology)
  • Received : 2012.01.18
  • Accepted : 2012.05.29
  • Published : 2012.06.25

Abstract

This study discusses photoresist forming using a composite grayscale to fabricate a Fresnel lens. Grayscale lithography is a common production method used to facilitate the forming of lenses with different curvatures and depths. However, this approach is time consuming and expensive. This study proposes a method for overcoming these obstacles by integrating a digital micromirror device and microscope to supplant the traditional physical grayscale mask. This approach provides a simple and practical maskless optical lithography system. According to the results, the two adjacent grayscales displayed substantial differences between the high grayscale and influence the low grayscale that ultimately affected photoresist formation. Furthermore, we show that change of up to 150% in the slope can be achieved by changing the grayscale gradient in the central zone and the ring profile. The results of the optical experiment show a focus change with different gray gradients.

Acknowledgement

Supported by : National Science Council of Taiwan

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