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Comparative Study of Nitrogen Incorporated SnO2 Deposited by Sputtering of Sn and SnO2 Targets

  • Kim, Youngrae (Microsystem Packaging Center, Seoul Technopark) ;
  • Kim, Sarah Eunkyung (Graduate School of NID Fusion Technology, Seoul National University of Science and Technology)
  • Received : 2012.08.10
  • Accepted : 2012.09.27
  • Published : 2012.09.30

Abstract

Nitrogen-incorporated $SnO_2$ thin films were deposited by rf magnetron sputtering. Comparative structural, electrical and optical studies of thin films deposited by sputtering of the Sn metallic target and sputtering of the $SnO_2$ ceramic target were conducted. The $SnO_2$ thin films deposited by sputtering of the Sn metallic target had a higher electrical conductivity due to a higher carrier concentration than those by sputtering of the $SnO_2$ ceramic target. Structurally the $SnO_2$ thin films deposited by sputtering of the $SnO_2$ ceramic target had a better crystallinity and a larger grain size. This study confirmed that there were distinct and clear differences in electrical, structural, and optical characteristics between $SnO_2$ thin films deposited by reactive sputtering of the Sn metallic target and by direct sputtering of the $SnO_2$ ceramic target.

Keywords

References

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Cited by

  1. Analysis of Sputter-Deposited SnO thin Film with SnO/Sn Composite Target vol.26, pp.4, 2016, https://doi.org/10.3740/MRSK.2016.26.4.222