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Electronics and Telecommunications Research Institute (한국전자통신연구원)
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Low Temperature Characteristics of Schottky Barrier Single Electron and Single Hole Transistors

  • Jang, Moongyu (Convergence Components & Materials Research Laboratory, ETRI) ;
  • Jun, Myungsim (Convergence Components & Materials Research Laboratory, ETRI) ;
  • Zyung, Taehyoung (Convergence Components & Materials Research Laboratory, ETRI)
  • Received : 2012.05.08
  • Accepted : 2012.08.27
  • Published : 2012.12.31
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Abstract

Schottky barrier single electron transistors (SB-SETs) and Schottky barrier single hole transistors (SB-SHTs) are fabricated on a 20-nm thin silicon-on-insulator substrate incorporating e-beam lithography and a conventional CMOS process technique. Erbium- and platinum-silicide are used as the source and drain material for the SB-SET and SB-SHT, respectively. The manufactured SB-SET and SB-SHT show typical transistor behavior at room temperature with a high drive current of $550{\mu}A/{\mu}m$ and $-376{\mu}A/{\mu}m$, respectively. At 7 K, these devices show SET and SHT characteristics. For the SB-SHT case, the oscillation period is 0.22 V, and the estimated quantum dot size is 16.8 nm. The transconductance is $0.05{\mu}S$ and $1.2{\mu}S$ for the SB-SET and SB-SHT, respectively. In the SB-SET and SB-SHT, a high transconductance can be easily achieved as the silicided electrode eliminates a parasitic resistance. Moreover, the SB-SET and SB-SHT can be operated as a conventional field-effect transistor (FET) and SET/SHT depending on the bias conditions, which is very promising for SET/FET hybrid applications. This work is the first report on the successful operations of SET/SHT in Schottky barrier devices.

Keywords

References

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