Korean Journal of Optics and Photonics (한국광학회지)

Optical Society of Korea (한국광학회)
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Measurement of Wafer Deformation using Deflectometry

편향법을 이용한 웨이퍼 변형 측정

  • Received : 2013.10.07
  • Accepted : 2013.10.28
  • Published : 2013.12.25
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Abstract

Phase-measuring deflectometry is a full-field gradient measuring technique that lends itself very well to testing specular optical surfaces. We have measured deformation of a large specular surface by deflectometry. In this work, we have used a Fourier-transform method to get the phase from a measured deformed fringe pattern, and we have used least squares method to obtain the height information of the specular surface from the calculated slope. Experimentally, we have confirmed that deflectometry can be used for deformation measurement of a specular surface like that of a wafer.

편향법을 이용하여 면적이 비교적 크고 거울과 같이 산란이 거의 없는 물체의 3차원 측정을 하였다. 편향법을 통해 얻은 왜곡 무늬로부터 위상과 기울기를 구하기 위해 푸리에변환 방법을 이용하였고, 구한 기울기로부터 높이를 구하기 위해 최소자승법을 이용하였다. 웨이퍼에 미세 응력을 주었을 때 변형을 편향법을 이용하여 측정할 수 있음을 확인하였다.

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References

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