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Expressions for Ellipsometric Constants of Samples Covered with Two Thick Incoherent Films

결맞음길이보다 두꺼운 두 개의 막에 덮여있는 시료의 타원식

  • Received : 2013.01.11
  • Accepted : 2013.03.21
  • Published : 2013.04.25

Abstract

The expressions for ellipsometric constants of a sample covered with two thick films are derived, where incoherent superposition of multiply reflected lights inside thick films is properly considered in the frame of the rotating analyzer ellipsometry. The derived expressions are successfully applied to the analysis of a silicon wafer with a thin silicon dioxide film on it, which is placed beneath a cover glass and an air gap.

회전검광자 방식의 타원계 구조에 기초하여 두꺼운 막들 내부에서 일어나는 다중반사에 인한 빛의 세기를 결맞지 않도록 중첩함으로써 결맞음길이보다 두꺼운 막 두 개가 다층박막시료 위에 있을 때 적용되는 타원상수 표현들을 유도하였다. 유도된 표현들을 커버유리와 공기층 아래에 있는 산화규소 박막이 코팅되어 있는 시료의 타원법 분석에 적용하여 그 유용성을 확인하였다.

Keywords

References

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