Journal of the Korean Society of Manufacturing Process Engineers (한국기계가공학회지)

The Korean Society of Manufacturing Process Engineers (한국기계가공학회)
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A Study on the expectation of residual layer thickness in roller pressing imprint process

롤러 가압 임프린트 공정에서 잔류막 두께 예측에 관한 연구

  • Published : 2013.02.28
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Abstract

In order to apply nano imprint technology in large area process, roller pressing is promising because of its low cost and high productivity. When pressing mold by roller, liquid resin is locally squeezed between mold and substrate. In this study, the main focus is to understand which process parameter affects residual layer. To do this, a simple analytical model was introduced. Especially, we consider the aspect ratio of patterns as essential cause of variation of the thickness in the equation. As a result, when the aspect ratio of pattern in the mold increases, the thickness of residual layer also increases. In conclusion, we show that the uniformity of residual layer could be accomplished by the control of velocity and pressing force in roller pressing imprint process.

Keywords

References

  1. Michael D. Austin, Haixiong Ge, Wei Wu, Mingtao Li, Zhaoning Yu, D. Wasserman, S. A. Lyon and Stephen Y. Chou, "Fabrication of 5 nm line width and 14 nm pitch features by nanoimprint lithography", Applied Physics Letters, Vol. 84, No. 26, pp. 5299-5301, 2004 https://doi.org/10.1063/1.1766071
  2. Wei Wu, William M. Tong, J. Bartman, Y. Chen, Robert Walmsley, Zhaoning Yu, Qiangfei Xia, Inkyu Park, Carl Picciotto, Jun Gao, Shih-Yuan Wang, Deborah Morecroft, Joel Yang, Karl K. Berggren and R. Stanley Williams, "Sub-10nm nanoimprint lithography by Wafer Bowing", Nano Letters, Vol.8, No.11, pp. 3865-3869, 2008. https://doi.org/10.1021/nl802295n
  3. Ian McMackin, Jin Choi, Philip Schumaker, Van Nguyen, Frank Xu, Ecron Thompson, Daniel Babbs, S.V. Sreenivasan, Michael Watts, Norman Schumaker, "Step and repeat UV Nanoimprint Lithography Tools and Processes", Proceedings of SPIE Vol. 5374, pp. 222-231, 2004.
  4. Hua Tan, Andrew Gilbertson and Stephen Y. Chou, "Roller Nanoimprint Lithography", Journalof Vacuum Science & Technology B, Vol. 16, No. 16, pp. 3926-3928, 1998. https://doi.org/10.1116/1.590438
  5. J.G. Kim, Y. Sim, Y. Cho, J.W. Seo, S. Kwon, J.W. Park, H.G. Choi, H. Kim, S. Lee, "Large Area Pattern Replication by Nanoimprint Lithography for LCD-TFT Application", Microelectronic Engineering, Vol. 86, No. 12, pp. 2427-2431, 2009. https://doi.org/10.1016/j.mee.2009.05.006
  6. Se Hyun Ahn and L. Jay Guo, "Large-Area Roll-to-Roll and Roll-to-Plate Nanoimprint Lithography: A Step toward High-Throughput Application of Continuous Nanoimprinting", ACS Nano, Vol. 3, No. 8, pp. 2304-2310, 2009. https://doi.org/10.1021/nn9003633
  7. Heydermana, L. J., Schifta, H., Davida, C., Gobrechta, J., Schweizerb, T., "Flow Behavior of Thin Polymer Films Used for Hot Embossing Lithography", Microelectronic Engineering, Vol. 54, pp. 229-245, 2000. https://doi.org/10.1016/S0167-9317(00)00414-7