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Reducing Separation Force for Projection Stereolithography based on Constrained Surface Technique

규제액면기법의 전사방식 광조형 시스템을 위한 이형력 감소

  • Kim, Hye Jung (Intelligent Control and Automation Division, Pusan National Univ.) ;
  • Ha, Young Myoung (School of Mechanical Engineering, Pusan National Univ.) ;
  • Park, In Baek (CA Tech Co.Ltd.) ;
  • Kim, Min Sub (Intelligent Control and Automation Division, Pusan National Univ.) ;
  • Jo, Kwang Ho (Intelligent Control and Automation Division, Pusan National Univ.) ;
  • Lee, Seok Hee (School of Mechanical Engineering, Pusan National Univ.)
  • 김혜정 (부산대학교 기계공학부 제어자동화시스템 전공) ;
  • 하영명 (부산대학교 기계공학부) ;
  • 박인백 ((주)씨에이텍) ;
  • 김민섭 (부산대학교 기계공학부 제어자동화시스템 전공) ;
  • 조광호 (부산대학교 기계공학부 제어자동화시스템 전공) ;
  • 이석희 (부산대학교 기계공학부)
  • Received : 2013.05.02
  • Accepted : 2013.08.20
  • Published : 2013.09.01

Abstract

Projection-based stereolithography is divided into constrained-surface and free-surface type according to controlling liquid layer. The constrained-surface type has a uniform layer thickness due to the use of a projection window, which covers the pattern generator such as liquid crystal display. However, the adhered resin on the projection window causes trouble and requires great separation force when the cured layer is separated from the window. To minimize the separation force, we developed a system to measure the separation force. The influence of material covering the pattern generator and the resin temperature is investigated in the system. Several structures according to the resin temperature and the velocity of z-axis elevation are compared. As a result, the fabrication condition to minimize the separation force reduces the process time.

Keywords

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