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Optical properties of vanadium dioxide thin films on c-Al2O3 (001) substrates by in-situ RF magnetron sputtering

  • Han, Seung Ho (Electronic Materials & Device Research Center, Korea Electronics Technology Institute) ;
  • Kang, So Hee (Electronic Materials & Device Research Center, Korea Electronics Technology Institute) ;
  • Kim, Hyeongkeun (Electronic Materials & Device Research Center, Korea Electronics Technology Institute) ;
  • Yoon, Dae Ho (School of Advanced Materials Science and Engineering, Sungkyunkwan University) ;
  • Yang, Woo Seok (Electronic Materials & Device Research Center, Korea Electronics Technology Institute)
  • Received : 2013.09.02
  • Accepted : 2013.10.18
  • Published : 2013.10.31

Abstract

Vanadium oxide thin films were deposited on $c-Al_2O_3$ (001) substrate by in-situ RF magnetron sputtering. Oxygen partial pressure was adjusted to prepare thermochromic $VO_2$ phase. X-ray diffraction patterns and scanning electron microscopy convincingly showed that plate-like $V_2O_5$ grains were changed into round-shape $VO_2$ grains as oxygen partial pressure decreased. After the optimized deposition conditions were fixed, the effect of substrate temperature and orientation on the optical properties of $VO_2$ thin films was analyzed.

Keywords

References

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