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Effects of PCB ENIG and OSP Surface Finishes on the Electromigration Reliability and Shear Strength of Sn-3.5Ag PB-Free Solder Bump

PCB의 ENIG와 OSP 표면처리에 따른 Sn-3.5Ag 무연솔더 접합부의 Electromigration 특성 및 전단강도 평가

  • 김성혁 (네패스 반도체연구소) ;
  • 이병록 (안동대학교 신소재공학부 청정에너지 소재기술 연구센터) ;
  • 김재명 (스태츠칩팩코리아 기술연구소) ;
  • 유세훈 (한국생산기술연구원 용접접합기술센터) ;
  • 박영배 (안동대학교 신소재공학부 청정에너지 소재기술 연구센터)
  • Received : 2014.01.10
  • Accepted : 2014.03.19
  • Published : 2014.03.27

Abstract

The effects of printed circuit board electroless nickel immersion gold (ENIG) and organic solderability preservative (OSP) surface finishes on the electromigration reliability and shear strength of Sn-3.5Ag Pb-free solder bump were systematically investigated. In-situ annealing tests were performed in a scanning electron microscope chamber at 130, 150, and $170^{\circ}C$ in order to investigate the growth kinetics of intermetallic compound (IMC). Electromigration lifetime and failure modes were investigated at $150^{\circ}C$ and $1.5{\times}10^5A/cm^2$, while ball shear tests and failure mode analysis were conducted under the high-speed conditions from 10 mm/s to 3000 mm/s. The activation energy of ENIG and OSP surface finishes during annealing were evaluated as 0.84 eV and 0.94 eV, respectively. The solder bumps with ENIG surface finish showed longer electromigration lifetime than OSP surface finish. Shear strengths between ENIG and OSP were similar, and the shear energies decreased with increasing shear speed. Failure analysis showed that electrical and mechanical reliabilities were very closely related to the interfacial IMC stabilities.

Keywords

References

  1. Directive 2002/95/EC on the Restriction of the Use of Certain Hazardous Substances in Electrical and Electronic Equipment(RoHS), The European Parliament and of the Council of the European Union, Jan. (2003).
  2. European Union WEEE Directive, 3rd Draft, May (2000).
  3. D. Suh, D. W. Kim, P. Liu, H. Kim, J. A. Weninger, C. M. Kumar, A. Prasad, B. W. Grimsley d H. B. Tejada, Mater. Sci. Eng. A, 460, 595 (2007).
  4. D. G. Kim, J. W. Kim, S. S. Ha, B. I. Noh, J. M. Koo, D. W. Park, M. W. Ko, and S. B. Jung, J. Alloys Compd., 458, 253 (2008). https://doi.org/10.1016/j.jallcom.2007.04.042
  5. F. Carson, S. M. Lee and N. Vijayaragavan, IEEE Compt, Packag. Manuf. Technol. (CPMT), p. 737 (2007).
  6. J. M. Koo, C. Y. Lee and S. B. Jung, J. Microelectron. Packag. Soc., 14(4), 71 (2007).
  7. D. Chang, F. Bai, Y. P. Wang and C.S. Hsiao, Proc. 6th Electron. Packag. Technol. Conf. (EPTC), IEEE p. 149 (2004).
  8. H. K. Lee, S. H. Son, H. Y. Lee and J. M. Jeon, J. Kor. Inst. Surf. Eng., 40(1), 32 (2007) https://doi.org/10.5695/JKISE.2007.40.1.032
  9. M. Ding, G Wang, B. Chao, P. S. Ho, P. Su and T. Uehling, J. Appl. Phys., 99, 094906 (2006). https://doi.org/10.1063/1.2193037
  10. J. M. Kim, M. H. Jeong, S. H. Yoo and Y. B. Park, J. Electron. Mater. 41, 4 (2012)
  11. J. M. Kim, M. H. Jeong, S. H. Yoo, C. W. Lee and Y. B. Park, Microelectronic Engineering, 89, 55 (2012) https://doi.org/10.1016/j.mee.2011.03.148
  12. S. H. Kim, J. M. Kim, S. H. Yoo and Y. B. Park, Curr. Appl. Phys., 13, S103 (2013) https://doi.org/10.1016/j.cap.2013.01.002
  13. S. H. Kim, J. M. Kim, S. H. Yoo and Y. B. Park, J. Microelectro. Packag. Soc., 19, 4 (2012)
  14. J. H. Lee, Y. B. Park, J. Electron. Mater., 38, 10 (2009) https://doi.org/10.1007/s11664-008-0522-4
  15. JESD22-B117A (Solder Ball Shear), JEDEC Standard, Jul. (2006).
  16. G. T. Lim, B. J. Kim, K. W. Lee, J. D. Kim, Y. C. Joo, and Y. B. Park, J. Electron. Mater., 38, 2228 (2009). https://doi.org/10.1007/s11664-009-0922-0
  17. Y. D. Lu, X. Q. He, Y. F. En, X. Wang, and Z. Q. Zhuang, Acta Mater., 57, 2560 (2009). https://doi.org/10.1016/j.actamat.2009.02.015
  18. Y. H. Lin, Y. C. Hu, C. M. Tsai, C. R. Kao, and K. N. Tu, Acta Mater., 53, 2029 (2005). https://doi.org/10.1016/j.actamat.2005.01.014
  19. Y. H. Lin, C. M. Tsai, Y. C. Hu, Y. L. Lin, and C. R. Kao, J. Electron. Mater., 34, 27 (2005). https://doi.org/10.1007/s11664-005-0176-4
  20. J. H. Lee, G. T. Lim, S. T. Yang, M. S. Suh, Q. H. Chung, K. Y. Byun, and Y. B. Park, J. Kor. Phys. Soc., 54, 1784 (2009). https://doi.org/10.3938/jkps.54.1784
  21. J. H. Lee and Y. B. Park, J. Electron. Mater. 38, 2194 (2009). https://doi.org/10.1007/s11664-009-0855-7
  22. J. S. Zhang, Y. C. Chan, Y. P. Wu, H. J. Xi, and F. S. Wu, J. Alloys Compd., 458, 492 (2008). https://doi.org/10.1016/j.jallcom.2007.04.040
  23. R. Bauer, A.H. Fischer, C. Birzer, and L. Alexa, Proc. 61st Electron. Comp. Technol. Conf. (Lake Buena Vista, FL: IEEE, p. 317 (2011).

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