Journal of the Korean institute of surface engineering (한국표면공학회지)

The Korean Institute of Surface Engineering (한국표면공학회)
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A Comparative Study of TiAlN Coatings Deposited by DC and Pulsed DC Asymmetric Bipolar Magnetron Sputtering

DC 스퍼터법과 비대칭 바이폴라 펄스 DC 스퍼터법으로 증착된 TiAlN 코팅막의 물성 비교연구

  • Chun, Sung-Yong (Department of Advanced Materials Science and Engineering, Mokpo National University) ;
  • Lee, Tae Yang (Department of Advanced Materials Science and Engineering, Mokpo National University)
  • 전성용 (목포대학교 신소재공학과) ;
  • 이태양 (목포대학교 신소재공학과)
  • Received : 2014.08.01
  • Accepted : 2014.08.25
  • Published : 2014.08.30
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Abstract

The paper presents the comparative results of TiAlN coatings deposited by DC and pulsed DC asymmetric bipolar magnetron sputtering systems. The results show that, with the decreasing duty cycle and increasing pulse frequency, the coating morphology changes from a columnar to a dense structure, with finer grains. Pulsed sputtered TiAlN coatings showed higher hardness, higher residual stress, and smaller grain sizes than dc prepared TiAlN coatings. Moreover residual stress of pulsed sputtered TiAlN coatings increased on increasing pulse frequency. Meanwhile, the surface roughness decreased continuously with increasing pulsed DC frequency up to 50 kHz.

Keywords

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