Applied Science and Convergence Technology

The Korean Vacuum Society (한국진공학회)
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Non-Invasive Plasma Monitoring Tools and Multivariate Analysis Techniques for Sensitivity Improvement

  • Jang, Haegyu (School of Chemical Engineering, Sungkyunkwan University (SKKU)) ;
  • Lee, Hak-Seung (SKKU Advanced Institute of Nanotechnology (SAINT), Sungkyunkwan University (SKKU)) ;
  • Lee, Honyoung (School of Semiconductor and Display Engineering, Sungkyunkwan University (SKKU)) ;
  • Chae, Heeyeop (School of Chemical Engineering, Sungkyunkwan University (SKKU))
  • Received : 2014.11.26
  • Accepted : 2014.11.30
  • Published : 2014.11.30
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Abstract

In this article, plasma monitoring tools and mulivariate analysis techniques were reviewed. Optical emission spectroscopy was reviewed for a chemical composition analysis tool and RF V-I probe for a physical analysis tool for plasma monitoring. Multivariate analysis techniques are discussed to the sensitivity improvement. Principal component analysis (PCA) is one of the widely adopted multivariate analysis techniques and its application to end-point detection of plasma etching process is discussed.

Keywords

References

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