Journal of the Korean Society for Heat Treatment (열처리공학회지)

The Korean Society for Heat Treatment (한국열처리공학회)
권호 표지
DOI QR코드

DOI QR Code

Influence of Deposition Rate on the Optoelectrical Properties of TIO Thin Films

증착율 변화에 따른 TIO 박막의 전기적, 광학적 특성 변화

  • Moon, Hyun-Joo (School of Materials Science and Engineering, University of Ulsan) ;
  • Kim, Daeil (School of Materials Science and Engineering, University of Ulsan)
  • 문현주 (울산대학교 첨단소재공학부) ;
  • 김대일 (울산대학교 첨단소재공학부)
  • Received : 2016.02.05
  • Accepted : 2016.02.23
  • Published : 2016.03.30
Download PDF
⟨ Previous Next ⟩

Abstract

TIO thin films were deposited on the poly-carbonate substrates with RF magnetron sputtering under different sputtering power condition to investigate the influence of deposition rate on the electrical and optical properties of the films. Although, all films have the similar carrier concentration, the films prepared at a lower deposition rate of 4 nm/min show a higher mobility of $5.96cm^2\;V^{-1}S^{-1}$ due to the low surface roughness. In addition, optical transmittance is also influenced by a deposition rate. Based on the figure of merit, it can be concluded that the lower deposition rate effectively enhances the opto-electrical performance of IGZO films for use as transparent conducting oxides in flexible display applications.

Keywords

References

  1. S. H. Kim and D. Kim : Ceram. Int. 41 (2015) 2770. https://doi.org/10.1016/j.ceramint.2014.10.095
  2. S. K. Kim and D. Kim : J. Kor. Soc. Heat Treat. 27 (2014) 225. https://doi.org/10.12656/jksht.2014.27.5.225
  3. S. Venkatachalam, Y. Iida and Y. Kanno : Superlattices and Microstructures 44 (2008) 127. https://doi.org/10.1016/j.spmi.2008.03.006
  4. A. Chaoumead, B. H. Joo, D. J. Kwak and Y. M. Sung : Appl. Surf. Sci. 275 (2013) 227. https://doi.org/10.1016/j.apsusc.2012.12.133
  5. G. Haacke : J. Appl. Phys. 47 (1976) 4086. https://doi.org/10.1063/1.323240
  6. J. Jeon, T. K. Gong, Y. M. Kong, H. M. Lee and D Kim : Electron. Mater. Lett. 11 (2015) 481. https://doi.org/10.1007/s13391-014-4410-1
  7. H. J. Moon and D. Kim : J. Kor. Soc. Heat Treat. 28 (2015) 291. https://doi.org/10.12656/jksht.2015.28.6.291
  8. P. Prepelita, V. Craciun, F. Garoi and A. Stacu : Appl. Surf. Sci. 352 (2015) 23. https://doi.org/10.1016/j.apsusc.2015.02.089
  9. J. Tanc : Amorphous and Liquid Semiconductor, Plenum, New York, 1974.

Cited by

  1. Influence of Post-depsotion Vacuum Annealing on the Properties of SnO2Thin Films vol.29, pp.4, 2016, https://doi.org/10.12656/jksht.2016.29.4.163
  2. Effect of Electron Irradiation on the Electrical and Optical Properties of SnO2Thin Films vol.29, pp.3, 2016, https://doi.org/10.12656/jksht.2016.29.3.109
  3. Influence of Ni Interlayer on the Electrical and Optical Properties of SnO2thin films vol.29, pp.5, 2016, https://doi.org/10.12656/jksht.2016.29.5.216
  4. Effect of Electron Irradiation on the Optical and Electrical Properties of TIO/Ag/TIO Films vol.30, pp.5, 2016, https://doi.org/10.7735/ksmte.2021.30.5.410