Mechanical Stability Evaluation of Thin Film with Spin-coater

스핀코터를 이용한 박막의 기계적 안정성 평가

  • Kim, Ji Eun (Department of Convergence Nanoscience, Hanyang University) ;
  • Kim, Jung Hwan (Department of Materials Science and Engineering, Hanyang University) ;
  • Hong, Seongchul (Department of Materials Science and Engineering, Hanyang University) ;
  • Cho, HanKu (Institute of Nano Science and Technology, Hanyang University) ;
  • Ahn, Jinho (Department of Materials Science and Engineering, Hanyang University)
  • 김지은 (한양대학교 자연과학대학 나노융합과학과) ;
  • 김정환 (한양대학교 공과대학 신소재공학과) ;
  • 홍성철 (한양대학교 공과대학 신소재공학과) ;
  • 조한구 (한양대학교 나노과학기술연구소) ;
  • 안진호 (한양대학교 공과대학 신소재공학과)
  • Received : 2016.02.03
  • Accepted : 2016.02.29
  • Published : 2016.03.31

Abstract

For high volume manufacturing using extreme ultraviolet (EUV) lithography, mask protection from contamination during lithography process must be solved, and EUV pellicle is the strongest solution. Based on the technical requirements of EUV pellicle, EUV pellicle should have large membrane area ($110{\times}140mm^2$) with film transmittance over 90% and mechanical stability. Even though pellicle that satisfies size standard with high transmittance has been reported, its mechanical stability has not been confirmed, nor is there a standard to evaluate the mechanical stability. In this study, we suggest a rather simple method evaluating mechanical stability of pellicle membrane using spin-coater which can emulate the linear accelerated motion. The test conditions were designed by simulating the acceleration distribution inside pellicle membrane through correlating the linear acceleration and centripetal acceleration, which occurs during linear movement and rotation movement, respectively. By these simulation results, we confirmed the possibility of using spin-coater to evaluate the mechanical stability of EUV pellicle.

Keywords

References

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