Journal of the Microelectronics and Packaging Society (마이크로전자및패키징학회지)

The Korean Microelectronics and Packaging Society (한국마이크로전자및패키징학회)
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Effects of Different Pretreatment Methods and Amounts of Reductant on Preparation of Silver-coated Copper Flakes Using Electroless Plating

무전해 도금에 의한 은코팅 구리 플레이크의 제조에서 전처리 공정 및 환원제 양의 영향

  • Oh, Sang Joo (Department of Materials Science & Engineering, Seoul National University of Science & Technology) ;
  • Kim, Ji Hwan (Department of Materials Science & Engineering, Seoul National University of Science & Technology) ;
  • Lee, Jong-Hyun (Department of Materials Science & Engineering, Seoul National University of Science & Technology)
  • 오상주 (서울과학기술대학교 신소재공학과) ;
  • 김지환 (서울과학기술대학교 신소재공학과) ;
  • 이종현 (서울과학기술대학교 신소재공학과)
  • Received : 2016.05.11
  • Accepted : 2016.06.27
  • Published : 2016.06.30
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Abstract

In the preparation of Ag-coated Cu flakes using L-ascorbic acid as a reductant for the electroless Ag plating, the effects of pretreatment methods and the reductant concentration on the uniformity of Ag coating layer and the anti-oxidation property of Ag-coated Cu flakes during the heating in air were evaluated. It was found that the removal degree of surface oxide layer during the pretreatment has great influence on the uniformity of Ag coating layer and the formation degree of hole defects in the flakes has slight effect on the anti-oxidation property of Ag-coated Cu flakes. It was also verified that the reductant concentration has great influence on the coverage uniformity and thickness of Ag coating, thus it was could be considered a main process parameter. When the reductant concentration was 0.04 M, high-quality Ag-coated Cu flakes was obtained. When the concentration increased to 0.06 M, however, the anti-oxidation property of Ag-coated Cu flakes became remarkably worse owing to remnant of Cu surface non-coated with Ag by the formation of pure Ag fine particles.

L-ascorbic acid 환원제를 사용하는 무전해 은도금 공정으로 Ag 코팅 Cu 플레이크를 제조하는 과정에서 전처리 방법 및 L-ascorbic acid의 농도에 따른 Ag 코팅층의 균일도 변화와 대기 중 승온에 따른 내산화 특성을 평가하였다. 전처리 방법에 따른 Cu 플레이크 표면 산화층의 제거 정도가 Ag 코팅층의 균일도에 큰 영향을 미치는 것을 관찰할 수 있었고, 플레이크에서의 홀 결함 발생정도도 Ag 코팅 Cu 플레이크의 내산화 특성에 다소 영향을 미쳤다. 또한 L-ascorbic acid 환원제의 농도는 Ag 코팅층의 생성 균일도 및 두께 등에 큰 영향을 미치는 대표 공정변수임을 확인할 수 있었는데, L-ascorbic acid의 농도가 0.04 M일 경우 가장 우수한 품질의 Ag 코팅 Cu 플레이크가 제조되었나, 농도를 0.06 M로 증가시킬 경우 미세한 순수 Ag 입자들의 생성으로 인해 Ag가 코팅되지 않은 Cu 표면 면적이 증가하면서 시료의 내산화 특성을 크게 감소시켰다.

Keywords

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