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A Study on Magnetized Inductively Coupled Plasma Using Cutoff Probe

Cutoff Probe를 이용한 자화유도결합 플라즈마의 특성 연구

  • Son, Eui-Jeong (Dept. of Electrical and Computer Engineering, Pusan National University) ;
  • Kim, Dong-Hyun (Dept. of Electrical and Computer Engineering, Pusan National University) ;
  • Lee, Ho-Jun (Dept. of Electrical and Computer Engineering, Pusan National University)
  • Received : 2016.06.17
  • Accepted : 2016.08.29
  • Published : 2016.10.01

Abstract

Electromagnetic wave simulation was performed to predict characteristics of manufactured cutoff probe at low temperature magnetized plasma medium. Microwave cutoff probe is designed for research the properties of magnetized inductively coupled plasma. It was shown that the cutoff probe method can safely be used for weakly magnetized high density plasma sources. Cutoff probe system with two port network analyzer has been prepared and applied to measure electron density distributions in large area, 13.56MHz driven weakly magnetized inductively coupled plasma source. The results shown that, the plasma frequency confirmed cut-off characteristics in low temperature plasma. Especially, cut-off characteristics was found at upper hybrid resonance frequency in the environment of the magnetic field. In case of a induced weak magnetic field in inductively coupled plasma, plasma density estimated from the cutoff frequency in the same way at unmagnetized plasma due to nearly same plasma frequency and upper hybrid resonance frequency. The plasma density is increased and uniformity is improved by applying a induced weak magnetic field in inductively coupled plasma.

Keywords

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